Maekawa Shinsuke, Seshimo Takehiro, Dazai Takahiro, Sato Kazufumi, Hatakeyama-Sato Kan, Nabae Yuta, Hayakawa Teruaki
Department of Materials Science and Engineering, School of Materials and Chemical Technology, Tokyo Institute of Technology, Tokyo, 152-8552, Japan.
Research & Development Department, Tokyo Ohka Kogyo Co., Ltd., Kanagawa, 253-0114, Japan.
Nat Commun. 2024 Jul 6;15(1):5671. doi: 10.1038/s41467-024-49839-0.
While block copolymer (BCP) lithography is theoretically capable of printing features smaller than 10 nm, developing practical BCPs for this purpose remains challenging. Herein, we report the creation of a chemically tailored, highly reliable, and practically applicable block copolymer and sub-10-nm line patterns by directed self-assembly. Polystyrene-block-[poly(glycidyl methacrylate)-random-poly(methyl methacrylate)] (PS-b-(PGMA-r-PMMA) or PS-b-PGM), which is based on PS-b-PMMA with an appropriate amount of introduced PGMA (10-33 mol%) is quantitatively post-functionalized with thiols. The use of 2,2,2-trifluoroethanethiol leads to polymers (PS-b-PGMs) with Flory-Huggins interaction parameters (χ) that are 3.5-4.6-times higher than that of PS-b-PMMA and well-defined higher-order structures with domain spacings of less than 20 nm. This study leads to the smallest perpendicular lamellar domain size of 12.3 nm. Furthermore, thin-film lamellar domain alignment and vertical orientation are highly reliably and reproducibly obtained by directed self-assembly to yield line patterns that correspond to a 7.6 nm half-pitch size.
虽然嵌段共聚物（BCP）光刻技术理论上能够印刷小于10纳米的特征图案，但开发适用于此目的的实用BCP仍然具有挑战性。在此，我们报告了通过定向自组装创建化学定制、高度可靠且实际适用的嵌段共聚物以及小于10纳米的线图案。聚苯乙烯-嵌段-[聚（甲基丙烯酸缩水甘油酯）-无规-聚（甲基丙烯酸甲酯）]（PS-b-(PGMA-r-PMMA) 或PS-b-PGM），它基于带有适量引入的PGMA（10-33摩尔%）的PS-b-PMMA，用硫醇进行定量后功能化。使用2,2,2-三氟乙硫醇会得到弗洛里-哈金斯相互作用参数（χ）比PS-b-PMMA高3.5-4.6倍的聚合物（PS-b-PGMs）以及畴间距小于20纳米的明确高阶结构。本研究得到了最小垂直层状畴尺寸为12.3纳米。此外，通过定向自组装高度可靠且可重复地获得薄膜层状畴排列和垂直取向，以产生对应于7.6纳米半间距尺寸的线图案。
