Media Research Center, Seagate Technology , 47488 Kato Road, Fremont, California 94538, United States.
Lam Research Corporation , 4400 Cushing Parkway, Fremont, California 94538, United States.
ACS Nano. 2017 Aug 22;11(8):7656-7665. doi: 10.1021/acsnano.7b02698. Epub 2017 Jul 20.
The directed self-assembly (DSA) and pattern transfer of poly(5-vinyl-1,3-benzodioxole-block-pentamethyldisilylstyrene) (PVBD-b-PDSS) is reported. Lamellae-forming PVBD-b-PDSS can form well resolved 5 nm (half-pitch) features in thin films with high etch selectivity. Reactive ion etching was used to selectively remove the PVBD block, and fingerprint patterns were subsequently transferred into an underlying chromium hard mask and carbon layer. DSA of the block copolymer (BCP) features resulted from orienting PVBD-b-PDSS on guidelines patterned by nanoimprint lithography. A density multiplication factor of 4× was achieved through a hybrid chemo-/grapho-epitaxy process. Cross-sectional scanning tunneling electron microscopy/electron energy loss spectroscopy (STEM/EELS) was used to analyze the BCP profile in the DSA samples. Wetting layers of parallel orientation were observed to form unless the bottom and top surface were neutralized with a surface treatment and top coat, respectively.
报道了聚（5-乙烯基-1,3-苯并二恶唑嵌段-戊甲基二硅氧烷）（PVBD-b-PDSS）的定向自组装（DSA）和图案转移。具有层状结构的 PVBD-b-PDSS 可以在薄膜中形成分辨率良好的 5nm（半节距）特征，且具有高蚀刻选择性。反应离子刻蚀用于选择性地去除 PVBD 嵌段，随后将指纹图案转移到下面的铬硬掩模和碳层中。通过纳米压印光刻图形化的导向线，实现了嵌段共聚物（BCP）特征的定向自组装。通过混合化学/图形外延工艺实现了 4×的密度倍增因子。使用横截面扫描隧道电子显微镜/电子能量损失光谱（STEM/EELS）分析了 DSA 样品中的 BCP 轮廓。除非底部和顶部表面分别用表面处理和顶涂层中和，否则会观察到平行取向的润湿层形成。
