Zhu Pang, Song Qingchuan, Bhagwat Sagar, Mayoussi Fadoua, Goralczyk Andreas, Nekoonam Niloofar, Sanjaya Mario, Hou Peilong, Tisato Silvio, Kotz-Helmer Frederik, Helmer Dorothea, Rapp Bastian E
Laboratory of Process Engineering, NeptunLab, Department of Microsystems Engineering (IMTEK), Albert Ludwig University of Freiburg, Freiburg, Germany.
Freiburg Center of Interactive Materials and Bioinspired Technologies(FIT), Albert Ludwig University of Freiburg, Freiburg, Germany.
Nat Commun. 2024 Jul 6;15(1):5673. doi: 10.1038/s41467-024-50008-6.
Microstructured molds are essential for fabricating various components ranging from precision optics and microstructured surfaces to microfluidics. However, conventional fabrication technology such as photolithography requires expensive equipment and a large number of processing steps. Here, we report a facile method to fabricate micromolds based on a reusable photoresponsive hydrogel: Uniform micropatterns are engraved into the hydrogel surface using photo masks under UV irradiation within a few minutes. Patterns are replicated using polydimethylsiloxane with minimum feature size of 40 μm and smoothness of R ~ 3.4 nm. After replication, the patterns can be fully erased by light thus allowing for reuse as a new mold without notable loss in performance. Utilizing greyscale lithography, patterns with different height levels can be produced within the same exposure step. We demonstrate the versatility of this method by fabricating diffractive optical elements devices and a microlens array and microfluidic device with 100 µm wide channels.
微结构模具对于制造从精密光学器件、微结构表面到微流体等各种部件至关重要。然而,诸如光刻等传统制造技术需要昂贵的设备和大量的加工步骤。在此,我们报道了一种基于可重复使用的光响应水凝胶制造微模具的简便方法:在紫外线照射下,使用光掩模在几分钟内将均匀的微图案刻蚀到水凝胶表面。使用聚二甲基硅氧烷复制图案,最小特征尺寸为40μm,表面粗糙度R约为3.4nm。复制后,图案可以通过光照完全擦除,从而可以作为新模具重复使用,而性能不会有明显损失。利用灰度光刻技术,可以在同一曝光步骤中制造出具有不同高度水平的图案。我们通过制造衍射光学元件器件、微透镜阵列以及具有100μm宽通道的微流体装置,展示了该方法的多功能性。