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动态共价聚合物网络向超快直接软光刻的稳态生长。

Homeostatic growth of dynamic covalent polymer network toward ultrafast direct soft lithography.

作者信息

Chen Di, Ni Chujun, Xie Lulin, Li Ye, Deng Shihong, Zhao Qian, Xie Tao

机构信息

Ningbo Research Institute of Zhejiang University, Ningbo 315100, China.

State Key Laboratory of Chemical Engineering, College of Chemical and Biological Engineering, Zhejiang University, Hangzhou 310027, China.

出版信息

Sci Adv. 2021 Oct 22;7(43):eabi7360. doi: 10.1126/sciadv.abi7360. Epub 2021 Oct 20.

Abstract

Soft lithography is a complementary extension of classical photolithography, which involves a multistep operation that is environmentally unfriendly and intrinsically limited to planar surfaces. Inspired by homeostasis processes in biology, we report a self-growth strategy toward direct soft lithography, bypassing conventional photolithography and its limitations. Our process uses a paraffin swollen light responsive dynamic polymer network. Selective light exposure activates the network locally, causing stress imbalance. This drives the internal redistribution of the paraffin liquid, yielding controllable formation of microstructures. This single-step process is completed in 10 seconds, does not involve any volatile solvents/reactants, and can be adapted to three-dimensional complex surfaces. The living nature of the network further allows sequential growth of hierarchical microstructures. The versatility and efficiency of our approach offer possibilities for future nanotechnologies beyond conventional microfabrication techniques.

摘要

软光刻是传统光刻技术的一种补充扩展,传统光刻涉及多步骤操作,对环境不友好且本质上局限于平面。受生物体内稳态过程的启发,我们报道了一种直接软光刻的自生长策略,绕过了传统光刻及其局限性。我们的工艺使用石蜡溶胀的光响应动态聚合物网络。选择性光照射局部激活网络,导致应力失衡。这驱动石蜡液体的内部重新分布,产生可控的微结构形成。这个单步过程在10秒内完成,不涉及任何挥发性溶剂/反应物,并且可以适应三维复杂表面。网络的活性本质进一步允许分层微结构的顺序生长。我们方法的多功能性和效率为超越传统微加工技术的未来纳米技术提供了可能性。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/ed6d/8528418/32ca7ea04841/sciadv.abi7360-f1.jpg

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