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钛合金的哈尔巴赫阵列磁场辅助磁性磨粒抛光工艺优化

Processing Optimization for Halbach Array Magnetic Field-Assisted Magnetic Abrasive Particles Polishing of Titanium Alloy.

作者信息

Qin Jia, Feng Ming, Cao Qipeng

机构信息

Faculty of Optoelectronic Manufacturing, Zhejiang Industry & Trade Vocational College, Wenzhou 325035, China.

College of Mechanical and Electrical Engineering, Wenzhou University, Wenzhou 325035, China.

出版信息

Materials (Basel). 2024 Jul 1;17(13):3213. doi: 10.3390/ma17133213.

Abstract

To extend the working life of products made of titanium alloy, it is necessary to improve the polishing method to diminish the remaining defects on the workpiece surface. The Halbach array-assisted magnetic abrasive particle polishing method for titanium alloy was employed in this work. The distribution of magnetic field strength was simulated and verified at first to learn the characteristics of the Halbach array used in this work. Then, the polishing performance of the polishing tool was studied by conducting the polishing test, which aimed to display the relationship between shear force and surface roughness with polishing time, and the surface morphology during polishing was also analyzed. Following the establishment of the response surface model, a study on the optimal polishing parameters was conducted to obtain the suitable parameters for maximum shear force and minimum surface roughness. The results show that the maximum shear force 6.11 N and minimum surface roughness 88 nm can be attained, respectively, under the conditions of (1) polishing tool speed of 724.254 r·min, working gap of 0.5 mm, and abrasive particle size of 200 μm; and (2) polishing tool speed of 897.87 r·min, working gap of 0.52 mm, and abrasive particle size of 160 μm.

摘要

为延长钛合金制成产品的使用寿命,有必要改进抛光方法以减少工件表面的残留缺陷。本研究采用了哈尔巴赫阵列辅助磁粒研磨抛光法对钛合金进行加工。首先对磁场强度分布进行模拟和验证,以了解本研究中所使用的哈尔巴赫阵列的特性。然后,通过进行抛光试验研究了抛光工具的抛光性能,该试验旨在展示剪切力和表面粗糙度与抛光时间之间的关系,并对抛光过程中的表面形貌进行了分析。在建立响应面模型之后,开展了最优抛光参数的研究,以获得使剪切力最大且表面粗糙度最小的合适参数。结果表明,分别在以下条件下可达到最大剪切力6.11 N和最小表面粗糙度88 nm:(1)抛光工具转速为724.254 r·min、工作间隙为0.5 mm、磨粒尺寸为200 μm;(2)抛光工具转速为897.87 r·min、工作间隙为0.52 mm、磨粒尺寸为160 μm。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/b055/11242181/fc90c151e138/materials-17-03213-g001.jpg

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