Lei Yang, Feng Ming, Wu Ke, Chen Jinxi, Ji Jianghao, Yuan Julong
Special Equipment Institute, Hangzhou Vocational & Technical College, Hangzhou 310018, China.
College of Mechanical and Electrical Engineering, Wenzhou University, Wenzhou 325035, China.
Materials (Basel). 2022 Jun 3;15(11):3995. doi: 10.3390/ma15113995.
Single-crystal sapphire (α-AlO) is an important material and widely used in many advanced fields. The semi-fixed abrasive grain processing method based on solid-phase reaction theory is a prominent processing method for achieving ultra-precision damage-free surfaces. In order to develop the proposed method for polishing sapphire, the basic characteristics of the semi-fixed abrasive grains polishing tool for polishing sapphire were determined. Weight analysis was used to study the influence rules of parameters on surface roughness and material removal rates using an orthogonal experiment. Then, the optimized polishing tool was obtained through a mixture of abrasive particle sizes to reduce the difficulty in molding the polishing tool. Finally, polishing experiments using different polishing tools were carried out to investigate polishing performance by considering the surface roughness, material removal rate and the surface morphology during polishing. The results showed that (1) external load affects the surface roughness and material removal rate the most, followed by abrasive particle size, sand bond ratio, revolution speed of the workpiece and he polishing tool; (2) the difficulty in manufacturing the polishing tool could be reduced by mixing larger abrasive particles with small abrasive particles; (3) the polishing tool with 200 nm and 1 μm particle sizes performed best in the first 210 min polishing.
单晶蓝宝石(α - Al₂O₃)是一种重要材料,广泛应用于许多先进领域。基于固相反应理论的半固着磨粒加工方法是实现超精密无损伤表面的一种突出加工方法。为了开发所提出的蓝宝石抛光方法,确定了用于抛光蓝宝石的半固着磨粒抛光工具的基本特性。采用重量分析法,通过正交试验研究参数对表面粗糙度和材料去除率的影响规律。然后,通过混合磨粒尺寸获得优化的抛光工具,以降低抛光工具成型的难度。最后,使用不同的抛光工具进行抛光实验,通过考虑抛光过程中的表面粗糙度、材料去除率和表面形貌来研究抛光性能。结果表明:(1)外部载荷对表面粗糙度和材料去除率的影响最大,其次是磨粒尺寸、砂结合比、工件转速和抛光工具转速;(2)通过将较大磨粒与较小磨粒混合可以降低抛光工具的制造难度;(3)粒径为200 nm和1 μm的抛光工具在前210分钟的抛光中表现最佳。