Liu Xinke, Yang Yongkai, Huang Zheng, Jiang Zhongwei, Zhou Jie, Li Bo, Ma Zhengweng, Zhang Yating, Huang Yeying, Li Xiaohua
College of Materials Science and Engineering, Institute of Microelectronics (IME), Guangdong Research Center for Interfacial Engineering of Functional Materials, Shenzhen University, Shenzhen 518060, China.
ACS Appl Mater Interfaces. 2024 Aug 14;16(32):42588-42596. doi: 10.1021/acsami.4c05146. Epub 2024 Jul 31.
Stacking of van der Waals (vdW) heterostructures and chemical element doping have emerged as crucial methods for enhancing the performance of semiconductors. This study proposes a novel strategy for modifying heterostructures by codoping MoS with two elements, Re and W, resulting in the construction of a ReWMoS/WSe heterostructure for the preparation of photodetectors. This approach incorporates multiple strategies to enhance the performance, including hybrid stacking of materials, type-II band alignment, and regulation of element doping. As a result, the ReWMoS/WSe devices demonstrate exceptional performance, including high photoresponsivity (1550.22 A/W), high detectivity (8.17 × 10 Jones), and fast response speed (rise/fall time, 190 ms/1.42 s). Moreover, the ability to tune the band gap through element doping enables spectral response in the ultraviolet (UV), visible light, and near-infrared (NIR) regions. This heterostructure fabrication scheme highlights the high sensitivity and potential applications of vdW heterostructure (vdWH) in optoelectronic devices.
范德华(vdW)异质结构的堆叠和化学元素掺杂已成为提高半导体性能的关键方法。本研究提出了一种通过用Re和W两种元素对MoS进行共掺杂来修饰异质结构的新策略,从而构建用于制备光电探测器的ReWMoS/WSe异质结构。这种方法采用了多种策略来提高性能,包括材料的混合堆叠、II型能带排列和元素掺杂的调控。结果,ReWMoS/WSe器件表现出卓越的性能,包括高光响应度(1550.22 A/W)、高探测率(8.17×10琼斯)和快速响应速度(上升/下降时间,190 ms/1.42 s)。此外,通过元素掺杂调节带隙的能力使得在紫外(UV)、可见光和近红外(NIR)区域具有光谱响应。这种异质结构制造方案突出了vdW异质结构(vdWH)在光电器件中的高灵敏度和潜在应用。