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基于ReS/h-BN/石墨烯异质结构的超快多位存储器。

An Ultrafast Multibit Memory Based on the ReS/h-BN/Graphene Heterostructure.

作者信息

Lu Haoyue, Wang Yan, Han Xuchen, Liu Jing

机构信息

State Key Laboratory of Precision Measurement Technology and Instrument, School of Precision Instruments and Optoelectronics Engineering, Tianjin University, No. 92 Weijin Road, Tianjin 300072, China.

出版信息

ACS Nano. 2024 Aug 27;18(34):23403-23411. doi: 10.1021/acsnano.4c06642. Epub 2024 Aug 1.

Abstract

The exponential growth of data in the big data era has made it imperative to improve the data storage density and calculation speed. Therefore, the development of a multibit memory with an ultrafast operational speed is of great significance. In this work, a floating-gate (FG) memory based on the ReS/h-BN/graphene van der Waals heterostructure is reported. The device exhibits ultrafast and multilevel nonvolatile memory characteristics, notably featuring an exceptionally large memory window of 113.36 V, a substantial erasing/programming current ratio of 10, an ultrafast operational speed of 30 ns, outstanding endurance exceeding 1000 cycles, and retention performance exceeding 1100 s. Furthermore, the device exhibits both electrically and optically tunable multilevel nonvolatile memory behavior. By controlling the voltage and light pulse parameters, the device achieves an electrical memory state of 130 levels (>7 bits) and an optical memory state of 45 levels (>5 bits).

摘要

大数据时代数据的指数级增长使得提高数据存储密度和计算速度变得势在必行。因此,开发具有超快运行速度的多位存储器具有重要意义。在这项工作中,报道了一种基于ReS/h-BN/石墨烯范德华异质结构的浮栅(FG)存储器。该器件展现出超快和多级非易失性存储特性,显著特点是具有113.36 V的超大存储窗口、10的显著擦除/编程电流比、30 ns的超快运行速度、超过1000次循环的出色耐久性以及超过1100 s的保持性能。此外,该器件还展现出电学和光学可调的多级非易失性存储行为。通过控制电压和光脉冲参数,该器件实现了130个电平(>7位)的电存储状态和45个电平(>5位)的光存储状态。

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