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用于析氢反应的介孔富镍镍铂薄膜中的电合成诱导铂皮效应

Electrosynthesis-Induced Pt Skin Effect in Mesoporous Ni-Rich Ni-Pt Thin Films for Hydrogen Evolution Reaction.

作者信息

Eiler Konrad, Pané Salvador, Döbeli Max, Müller Arnold, Vockenhuber Christof, Sort Jordi, Pellicer Eva

机构信息

Departament de Física, Universitat Autònoma de Barcelona, 08193 Bellaterra, Spain.

Institute of Robotics and Intelligent Systems (IRIS), ETH Zurich, CH-8092 Zurich, Switzerland.

出版信息

ACS Appl Mater Interfaces. 2024 Aug 14;16(32):42305-42311. doi: 10.1021/acsami.4c09288. Epub 2024 Aug 2.

DOI:10.1021/acsami.4c09288
PMID:39092459
原文链接:https://pmc.ncbi.nlm.nih.gov/articles/PMC11331433/
Abstract

A Pt skin effect, i.e., an enrichment of Pt within the first 1-2 nm from the surface, is observed in as-prepared electrodeposited Ni-rich Ni-Pt thin films. This effect, revealed by Rutherford backscattering (RBS), is present for both dense thin films and mesoporous thin films synthesized by micelle-assisted electrodeposition from a chloride-based electrolyte. Due to the Pt skin effect, the Ni-rich thin films show excellent stability at the hydrogen evolution reaction (HER) in acidic media, during which a gradient in the Pt/Ni ratio is established along the thickness of the thin films, while the activity at the HER remains unaffected by this structural change. Further characterization by elastic recoil detection with He ions analysis shows that hydrogen profiles are similar to those of Pt: a surface hydrogen peak coincides with the Pt skin, and a gradient in hydrogen concentration is established during HER in acidic media, together with a considerable uptake in hydrogen. A comparative study shows that in alkaline media, hydrogen evolution has little to no effect on the structural properties of the thin films, even for much longer times of exposure. The mesoporous thin films, in addition to their higher efficiency at HER compared to dense thin films, also show lower internal stress, as determined by Rietveld refinement of grazing incidence X-ray diffraction patterns. The latter also reveal a fully single-phase and nanocrystalline structure for all thin films with varying Ni contents.

摘要

在制备好的富镍镍铂电沉积薄膜中观察到了铂表面效应,即在距表面1-2纳米范围内铂的富集。这种效应通过卢瑟福背散射(RBS)揭示,对于通过基于氯化物的电解液的胶束辅助电沉积合成的致密薄膜和介孔薄膜均存在。由于铂表面效应,富镍薄膜在酸性介质中的析氢反应(HER)中表现出优异的稳定性,在此期间,沿薄膜厚度建立了铂/镍比梯度,而析氢反应的活性不受这种结构变化的影响。通过氦离子分析的弹性反冲检测进一步表征表明,氢分布与铂相似:表面氢峰与铂表面层重合,在酸性介质中的析氢反应期间建立了氢浓度梯度,同时有相当数量的氢吸收。一项对比研究表明,在碱性介质中,即使暴露时间长得多,析氢对薄膜的结构性能也几乎没有影响。介孔薄膜除了在析氢反应中比致密薄膜具有更高的效率外,还表现出较低的内应力,这是通过掠入射X射线衍射图谱的Rietveld精修确定的。后者还揭示了所有不同镍含量的薄膜均具有完全单相和纳米晶结构。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/2948/11331433/c8de659c44fe/am4c09288_0007.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/2948/11331433/6da49ce14f08/am4c09288_0001.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/2948/11331433/71cb67ea7ee7/am4c09288_0002.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/2948/11331433/f96e904efe82/am4c09288_0003.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/2948/11331433/0da0298d2a26/am4c09288_0004.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/2948/11331433/bb64d74b4078/am4c09288_0005.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/2948/11331433/f3281f8da763/am4c09288_0006.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/2948/11331433/c8de659c44fe/am4c09288_0007.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/2948/11331433/6da49ce14f08/am4c09288_0001.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/2948/11331433/71cb67ea7ee7/am4c09288_0002.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/2948/11331433/f96e904efe82/am4c09288_0003.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/2948/11331433/0da0298d2a26/am4c09288_0004.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/2948/11331433/bb64d74b4078/am4c09288_0005.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/2948/11331433/f3281f8da763/am4c09288_0006.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/2948/11331433/c8de659c44fe/am4c09288_0007.jpg

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