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用于增强光响应性的自掺杂单层二维二硫化钼的开发。

Development of Self-Doped Monolayered 2D MoS for Enhanced Photoresponsivity.

作者信息

Mallick Sagar, Majumder Sudipta, Maiti Paramita, Kesavan Kamali, Rahman Atikur, Rath Ashutosh

机构信息

Central Characterization Department, CSIR-Institute of Minerals and Materials Technology, Bhubaneswar, Odisha, 751013, India.

Academy of Scientific & Innovative Research, Ghaziabad, 201002, India.

出版信息

Small. 2024 Nov;20(46):e2403225. doi: 10.1002/smll.202403225. Epub 2024 Aug 3.

DOI:10.1002/smll.202403225
PMID:39096114
Abstract

Transition metal dichalcogenides (TMDs) exist in two distinct phases: the thermodynamically stable trigonal prismatic (2H) and the metastable octahedral (1T) phase. Phase engineering has emerged as a potent technique for enhancing the performance of TMDs in optoelectronics applications. Nevertheless, understanding the mechanism of phase transition in TMDs and achieving large-area synthesis of phase-controlled TMDs continue to pose significant challenges. This study presents the synthesis of large-area monolayered 2H-MoS and mixed-phase 1T/2H-MoS by controlling the growth temperature in the chemical vapor deposition (CVD) method without use of a catalyst. The field-effect transistors (FETs) devices fabricated with 1T/2H-MoS mixed-phase show an on/off ratio of 10. Photo response devices fabricated with 1T/2H-MoS mixed-phase show ≈55 times enhancement in responsivity (from 0.32 to 17.4 A W) and 10 times increase in the detectivity (from 4.1 × 10 to 2.48 × 10 cm Hz W) compare to 2H-MoS. Introducing the metallic 1T phase within the 2H phase contributes additional carriers to the material, which prevents the electron-hole recombination and thereby increases the carrier density in the 1T/2H-MoS mixed-phase in comparison to 2H-MoS This work provides insights into the self-doping effects of 1T phase in 2H MoS, enabling the tuning of 2D TMDs properties for optoelectronic applications.

摘要

过渡金属二硫属化物(TMDs)存在两种不同的相:热力学稳定的三角棱柱体相(2H)和亚稳的八面体相(1T)。相工程已成为一种在光电子应用中提高TMDs性能的有效技术。然而,理解TMDs中的相变机制并实现相控TMDs的大面积合成仍然面临重大挑战。本研究展示了通过在化学气相沉积(CVD)方法中控制生长温度,在不使用催化剂的情况下合成大面积单层2H-MoS和混合相1T/2H-MoS。用1T/2H-MoS混合相制造的场效应晶体管(FETs)器件的开/关比为10。与2H-MoS相比,用1T/2H-MoS混合相制造的光响应器件的响应度提高了约55倍(从0.32提高到17.4 A W),探测率提高了10倍(从4.1×10提高到2.48×10 cm Hz W)。在2H相内引入金属1T相为材料贡献了额外的载流子,这阻止了电子-空穴复合,从而与2H-MoS相比增加了1T/2H-MoS混合相中的载流子密度。这项工作为2H MoS中1T相的自掺杂效应提供了见解,能够调整二维TMDs的性能以用于光电子应用。

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