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Janus HfGeZH(Z = N、P、As)单层中的大压电响应和超高载流子迁移率:第一性原理研究

Large piezoelectric responses and ultra-high carrier mobility in Janus HfGeZH (Z = N, P, As) monolayers: a first-principles study.

作者信息

Vu Tuan V, Phuc Huynh V, Phuong Le T T, Vi Vo T T, Kartamyshev A I, Hieu Nguyen N

机构信息

Laboratory for Computational Physics, Institute for Computational Science and Artificial Intelligence, Van Lang University Ho Chi Minh City Vietnam

Faculty of Mechanical - Electrical and Computer Engineering, School of Technology, Van Lang University Ho Chi Minh City Vietnam.

出版信息

Nanoscale Adv. 2024 Jun 14;6(16):4128-4136. doi: 10.1039/d4na00304g. eCollection 2024 Aug 6.

Abstract

Breaking structural symmetry in two-dimensional layered Janus materials can result in enhanced new phenomena and create additional degrees of piezoelectric responses. In this study, we theoretically design a series of Janus monolayers HfGeZH (Z = N, P, As) and investigate their structural characteristics, crystal stability, piezoelectric responses, electronic features, and carrier mobility using first-principles calculations. Phonon dispersion analysis confirms that HfGeZH monolayers are dynamically stable and their mechanical stability is also confirmed through the Born-Huang criteria. It is demonstrated that while HfGeNH is a semiconductor with a large bandgap of 3.50 eV, HfGePH and HfGeAsH monolayers have narrower bandgaps being 1.07 and 0.92 eV, respectively. When the spin-orbit coupling is included, large spin-splitting energy is found in the electronic bands of HfGeZH. Janus HfGeZH monolayers can be treated as piezoelectric semiconductors with the coexistence of both in-plane and out-of-plane piezoelectric responses. In particular, HfGeZH monolayers exhibit ultra-high electron mobilities up to 6.40 × 10 cm V s (HfGeAsH), indicating that they have potential for various applications in nanoelectronics.

摘要

打破二维层状Janus材料中的结构对称性可导致增强的新现象,并产生额外的压电响应程度。在本研究中,我们从理论上设计了一系列Janus单层HfGeZH(Z = N、P、As),并使用第一性原理计算研究了它们的结构特征、晶体稳定性、压电响应、电子特性和载流子迁移率。声子色散分析证实HfGeZH单层是动态稳定的,并且通过Born-Huang准则也证实了它们的机械稳定性。结果表明,HfGeNH是一种具有3.50 eV大带隙的半导体,而HfGePH和HfGeAsH单层的带隙较窄,分别为1.07和0.92 eV。当考虑自旋轨道耦合时,在HfGeZH的电子能带中发现了大的自旋分裂能。Janus HfGeZH单层可被视为具有面内和面外压电响应共存的压电势半导体。特别是,HfGeZH单层表现出高达6.40×10 cm V s(HfGeAsH)的超高电子迁移率,表明它们在纳米电子学中有各种应用的潜力。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/0f67/11302187/d44cbbd2852d/d4na00304g-f1.jpg

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