Chen Danxuan, Jiang Jin, Weatherley Thomas F K, Carlin Jean-François, Banerjee Mitali, Grandjean Nicolas
Laboratory of Advanced Semiconductors for Photonics and Electronics, Institute of Physics, École Polytechnique Fédérale de Lausanne (EPFL), CH-1015 Lausanne, Switzerland.
Laboratory of Quantum Physics, Institute of Physics, École Polytechnique Fédérale de Lausanne (EPFL), CH-1015 Lausanne, Switzerland.
Nano Lett. 2024 Aug 21;24(33):10124-10130. doi: 10.1021/acs.nanolett.4c02259. Epub 2024 Aug 12.
In this study, we investigate the impact of two-dimensional MoS coating on the optical properties of surface GaN/AlGaN quantum wells (QWs). A strong enhancement in GaN QW light emission is observed with monolayer-MoS coating, yielding luminescence intensity comparable to that from a QW capped by an AlGaN barrier. Our results demonstrate that MoS, despite its quite different nature from III-nitride semiconductors, acts as an effective barrier for surface GaN QWs and suppresses spatially localized intrinsic surface states. This finding provides novel pathways for efficient III-nitride surface passivation.
在本研究中,我们研究了二维MoS涂层对表面GaN/AlGaN量子阱(QW)光学性质的影响。通过单层MoS涂层观察到GaN量子阱发光有显著增强,产生的发光强度与由AlGaN势垒覆盖的量子阱相当。我们的结果表明,尽管MoS与III族氮化物半导体性质截然不同,但它对表面GaN量子阱起到了有效的势垒作用,并抑制了空间局域化的本征表面态。这一发现为高效的III族氮化物表面钝化提供了新途径。