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利用蓝光活化自由基的共价功能化:关于芳基偶氮砜与石墨烯结合的反应机理

Covalent functionalization by using blue light activated radicals: on the reaction mechanisms of arylazo sulfone binding on graphene.

作者信息

Mameli Alessandro, Kovtun Alessandro, Jones Derek, Benekou Vasiliki, Palermo Vincenzo, Bandini Marco, Melucci Manuela

机构信息

Dipartimento di Chimica "Giacomo Ciamician" Alma Mater Studiorum - Università di Bologna Via P. Gobetti, 85 40129 Bologna Italy.

Istituto per la Sintesi Organica e la Fotoreattività (ISOF), Consiglio Nazionale delle Ricerche (CNR) Via P. Gobetti, 101 40129 Bologna Italy

出版信息

Nanoscale Adv. 2024 Aug 1;6(20):5080-91. doi: 10.1039/d4na00359d.

Abstract

Covalent functionalization of graphene presents a pivotal strategy to enhance its surface properties and overcome inherent chemical inertness. While diazonium salts have been extensively utilized for this purpose, their limitations necessitate exploration of alternative approaches. Arylazo sulfones, such as diazonium salt derivatives serving as chromophores, offer a promising solution, enabling photochemical reactions under visible light. Here, we propose a novel method for rapid covalent photofunctionalization of chemical vapor deposition (CVD) graphene on copper substrates using arylazo sulfones. The generation of aryl radicals - chlorobenzene in this case - was achieved through blue light LED irradiation of 4-chlorophenylazo methyl sulfone solution in acetonitrile. Efficient surface covalent modification of graphene was verified by observing (i) the photogeneration of radicals with a decrease in the π-π* band absorbance and an increase in the n-π* of arylazosulfone solution by UV-Vis spectroscopy; (ii) an increase in C sp defects on graphene from the Raman D band, the Auger C KLL signal and graphene C 1s X-ray photoelectron spectroscopy (XPS); and (iii) the presence of the chlorobenzene XPS Cl 2p signal. The aryl radical generation was enhanced by the copper substrate during irradiation, with a possible double path reaction mechanism. This approach highlights the versatility of arylazo sulfones in covalently patterning graphene surfaces, thus unlocking opportunities by overcoming the current approach consisting of the deposition of resist materials with successive cycles of lithography and electrochemistry.

摘要

石墨烯的共价功能化是增强其表面性质并克服固有化学惰性的关键策略。虽然重氮盐已被广泛用于此目的,但其局限性使得有必要探索替代方法。芳基偶氮砜,例如用作发色团的重氮盐衍生物,提供了一种有前景的解决方案,能够在可见光下进行光化学反应。在此,我们提出了一种使用芳基偶氮砜对铜衬底上的化学气相沉积(CVD)石墨烯进行快速共价光功能化的新方法。通过蓝光LED照射乙腈中的4-氯苯基偶氮甲基砜溶液实现了芳基自由基(在这种情况下为氯苯)的生成。通过以下方式验证了石墨烯的有效表面共价修饰:(i)通过紫外-可见光谱观察到芳基偶氮砜溶液的π-π带吸光度降低和n-π增加,同时有自由基的光生;(ii)拉曼D带、俄歇C KLL信号和石墨烯C 1s X射线光电子能谱(XPS)表明石墨烯上C sp缺陷增加;(iii)存在氯苯XPS Cl 2p信号。在照射过程中,铜衬底增强了芳基自由基的生成,可能存在双路径反应机制。这种方法突出了芳基偶氮砜在共价图案化石墨烯表面方面的多功能性,从而通过克服当前由光刻和电化学的连续循环沉积抗蚀剂材料的方法,开辟了新的机会。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/b113/11460587/4ab54c4fadfd/d4na00359d-s1.jpg

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