Back Song Yi, Cho Hyunyong, Zhang Wenhao, Mori Takao, Rhyee Jong-Soo
Department of Applied Physics and Institute of Natural Sciences, Kyung Hee University, Yong-in 17104, South Korea.
International Center for Materials Nanoarchitectonics (WPI-MANA), National Institute for Materials Science (NIMS), 1-1 Namiki, Tsukuba 305-0044, Ibaraki, Japan.
ACS Appl Mater Interfaces. 2024 Sep 4;16(35):46363-46373. doi: 10.1021/acsami.4c09683. Epub 2024 Aug 26.
GeTe-based alloys have been studied as promising TE materials in the midtemperature range as a lead-free alternate to PbTe due to their nontoxicity. Our previous study on GeTeI revealed that I-doping increases lattice anharmonicity and decreases the structural phase transition temperature, consequently enhancing the thermoelectric performance. Our current work elucidates the synergistic interplay between band convergence and lattice softening, resulting in an enhanced thermoelectric performance for GeSbTeI ( = 0.10, 0.12, 0.14, and 0.16). Sb doping in GeTeI serves a double role: first, it leads to lattice softening, thereby reducing lattice thermal conductivity; second, it promotes a band convergence, thus a higher valley degeneracy. The presence of lattice softening is corroborated by an increase in the internal strain ratio observed in X-ray diffraction patterns. Doping also introduces phonon scattering centers, further diminishing lattice thermal conductivity. Additionally, variations in the electronic band structure are indicated by an increase in density of state effective mass and a decrease in carrier mobility with Sb concentration. Besides, Sb doping optimizes the carrier concentration efficiently. Through a two-band modeling and electronic band structure calculations, the valence band convergence due to Sb doping can be confirmed. Specifically, the energy difference between valence bands progressively narrows upon Sb doping in GeSbTeI ( = 0, 0.02, 0.05, 0.10, 0.12, 0.14, and 0.16). As a culmination of these effects, we have achieved a significant enhancement in for GeSbTeI ( = 0.10, 0.12, 0.14, and 0.16) across the entire range of measured temperatures. Notably, the sample with = 0.12 exhibits the highest value of 1.70 at 723 K.
基于GeTe的合金由于其无毒特性,作为PbTe的无铅替代品,已被研究作为中温范围内有前景的热电材料。我们之前对GeTeI的研究表明,碘掺杂增加了晶格非谐性并降低了结构相变温度,从而提高了热电性能。我们目前的工作阐明了能带收敛与晶格软化之间的协同相互作用,从而提高了GeSbTeI( = 0.10、0.12、0.14和0.16)的热电性能。在GeTeI中掺杂锑起到双重作用:首先,它导致晶格软化,从而降低晶格热导率;其次,它促进能带收敛,进而提高谷简并度。X射线衍射图谱中观察到的内应变比增加证实了晶格软化的存在。掺杂还引入了声子散射中心,进一步降低了晶格热导率。此外,电子能带结构的变化表现为态密度有效质量增加以及载流子迁移率随锑浓度降低。此外,锑掺杂有效地优化了载流子浓度。通过双带建模和电子能带结构计算,可以证实由于锑掺杂导致的价带收敛。具体而言,在GeSbTeI( = 0、0.02、0.05、0.10、0.12、0.14和0.16)中进行锑掺杂时,价带之间的能量差逐渐缩小。作为这些效应的结果,我们在整个测量温度范围内实现了GeSbTeI( = 0.10、0.12、0.14和0.16)的显著增强。值得注意的是, = 0.12的样品在723 K时表现出最高的 值为1.70。