Fumina Alina, Speshilova Anastasiya, Belyanov Ilya, Endiiarova Ekaterina, Osipov Artem
Peter the Great St. Petersburg Polytechnic University, 195251 St. Petersburg, Russian Federation.
Academic University, Russian Academy of Sciences, 194021 St. Petersburg, Russian Federation.
Langmuir. 2024 Oct 15;40(41):21484-21498. doi: 10.1021/acs.langmuir.4c02275. Epub 2024 Sep 2.
The possibility of using colloidal lithography at the industrial level depends on the ability to form defect-free coatings over large areas. The spin-coating method has not yet shown acceptable results, but a more detailed studying of the regularities of this process may improve the quality of masks. The Langmuir-Blodgett method is expected to be the most preferable for forming high-quality large-scale monolayers. Real-time controlling the surface pressure of the monolayer can allow to obtain close-packed arrays with long-range order. In this work, to develop the spin-coating technology, the influence of technological parameters (spin-coating speed and time, concentrations of components in suspension) on the substrate coverage area with a monolayer of polystyrene spheres (1.25 μm) was studied. An original automated Langmuir-Blodgett system was developed to study the influence of the monolayer surface pressure on its quality using polystyrene spheres (1.25, 1.8, 2.1 μm). The developed spin-coating technology resulted in a record coverage area (90%) of Si substrate (76 mm) and a defect-free hexagonally ordered domain area of 500 μm. As a result of the developed Langmuir-Blodgett technique, a close-packed monolayer coating was obtained over the entire substrate area (coverage area 99.5%, defect-free domain area 3000 μm) without the use of any surfactants.
在工业层面使用胶体光刻技术的可能性取决于在大面积上形成无缺陷涂层的能力。旋涂法尚未取得可接受的结果，但对该过程规律进行更详细的研究可能会提高掩膜的质量。预计朗缪尔-布洛杰特法对于形成高质量的大规模单分子层最为合适。实时控制单分子层的表面压力能够得到具有长程有序的密排阵列。在这项工作中，为了开发旋涂技术，研究了工艺参数（旋涂速度和时间、悬浮液中各组分的浓度）对聚苯乙烯球体（1.25μm）单分子层覆盖衬底面积的影响。开发了一种原始的自动化朗缪尔-布洛特特系统，以研究使用聚苯乙烯球体（1.25、1.8、2.1μm）时单分子层表面压力对其质量的影响。所开发的旋涂技术使硅衬底（76mm）的覆盖面积达到创纪录的90%，且无缺陷的六边形有序区域面积为500μm。通过所开发的朗缪尔-布洛杰特技术，在整个衬底区域获得了密排单分子层涂层（覆盖面积99.5%，无缺陷区域面积3000μm），且未使用任何表面活性剂。
