Shen Shih-Jyun, Lee Demei, Wu Yu-Chen, Liu Shih-Jung
Department of Mechanical Engineering, Chang Gung University, Taoyuan 33302, Taiwan.
Department of Anesthesiology, Chang Gung Memorial Hospital-Linkou, Taoyuan 33305, Taiwan.
Materials (Basel). 2021 Jan 7;14(2):274. doi: 10.3390/ma14020274.
This paper reports the binary colloid assembly of nanospheres using spin coating techniques. Polystyrene spheres with sizes of 900 and 100 nm were assembled on top of silicon substrates utilizing a spin coater. Two different spin coating processes, namely concurrent and sequential coatings, were employed. For the concurrent spin coating, 900 and 100 nm colloidal nanospheres of latex were first mixed and then simultaneously spin coated onto the silicon substrate. On the other hand, the sequential coating process first created a monolayer of a 900 nm nanosphere array on the silicon substrate, followed by the spin coating of another layer of a 100 nm colloidal array on top of the 900 nm array. The influence of the processing parameters, including the type of surfactant, spin speed, and spin time, on the self-assembly of the binary colloidal array were explored. The empirical outcomes show that by employing the optimal processing conditions, binary colloidal arrays can be achieved by both the concurrent and sequential spin coating processes.
本文报道了使用旋涂技术进行纳米球的二元胶体组装。利用旋涂机将尺寸为900纳米和100纳米的聚苯乙烯球组装在硅基板上。采用了两种不同的旋涂工艺，即同时旋涂和顺序旋涂。对于同时旋涂，首先将900纳米和100纳米的乳胶胶体纳米球混合，然后同时旋涂到硅基板上。另一方面，顺序涂覆工艺首先在硅基板上形成一层900纳米纳米球阵列的单层，然后在900纳米阵列之上旋涂另一层100纳米胶体阵列。探讨了包括表面活性剂类型、旋转速度和旋转时间在内的加工参数对二元胶体阵列自组装的影响。实验结果表明，通过采用最佳加工条件，同时旋涂和顺序旋涂工艺均可实现二元胶体阵列。
