Tran Thanh-Xuan, Jang Yu Jin, Vu Van-Tu, Jung Chan-Woo, Do Van Dam, Jin Yeongrok, Lee Jaekwang, Kim Hyunjung, Kim Ji-Hee
Department of Energy Science, Sungkyunkwan University, Suwon 16419, Republic of Korea.
Center for Ultrafast Phase Transformation, Department of Physics, Sogang University, Seoul 04107, Republic of Korea.
Nano Lett. 2024 Sep 11;24(36):11163-11169. doi: 10.1021/acs.nanolett.4c01837. Epub 2024 Sep 3.
Prolonging hot carrier cooling, a crucial factor in optoelectronic applications, including hot carrier photovoltaics, presents a significant challenge. High-energy band-nesting excitons within parallel bands offer a promising and underexplored avenue for addressing this issue. Here, we exploit an exceptional D exciton cooling prolongation of 2 to 3 orders of magnitude compared to sub-picosecond in typical transition metal dichalcogenides (TMDs) owing to the complex Coulomb environment and the sequential and mismatch-valley relaxation. Simultaneously, the intervalley scattering upconversion of band-edge excitons with the slow D exciton formation in the metastable Γ valley/hill also reduces the cooling rate. We successfully extract D and C excitons as hot carriers through integrating with various thicknesses of TiO, achieving the highest efficiency of 98% and 85% at a Ti thickness of 2 nm. Our findings highlight the potential of band-nesting excitons for extending hot carrier cooling time, paving the way for advancements in hot carrier-based optoelectronic devices.
延长热载流子冷却时间是光电子应用中的一个关键因素,包括热载流子光伏,这带来了重大挑战。平行能带内的高能带嵌套激子为解决这一问题提供了一条有前景且未被充分探索的途径。在这里,由于复杂的库仑环境以及顺序和错配谷弛豫,与典型的过渡金属二硫属化物(TMDs)中亚皮秒级的情况相比,我们利用了一种特殊的D激子冷却延长,延长了2到3个数量级。同时,在亚稳Γ谷/峰中带边激子的谷间散射上转换以及缓慢的D激子形成也降低了冷却速率。通过与不同厚度的TiO集成,我们成功地提取了D和C激子作为热载流子,在Ti厚度为2 nm时实现了98%和85%的最高效率。我们的研究结果突出了带嵌套激子在延长热载流子冷却时间方面的潜力,为基于热载流子的光电器件的发展铺平了道路。