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通过螺旋度分辨二维电子光谱揭示的单层MoS中低于10 fs的谷间激子耦合

Sub-10 fs Intervalley Exciton Coupling in Monolayer MoS Revealed by Helicity-Resolved Two-Dimensional Electronic Spectroscopy.

作者信息

Lloyd Lawson T, Wood Ryan E, Mujid Fauzia, Sohoni Siddhartha, Ji Karen L, Ting Po-Chieh, Higgins Jacob S, Park Jiwoong, Engel Gregory S

机构信息

Department of Chemistry, The University of Chicago, Chicago, Illinois 60637, United States.

James Franck Institute, The University of Chicago, Chicago, Illinois 60637, United States.

出版信息

ACS Nano. 2021 Jun 22;15(6):10253-10263. doi: 10.1021/acsnano.1c02381. Epub 2021 Jun 7.

DOI:10.1021/acsnano.1c02381
PMID:34096707
Abstract

The valley pseudospin at the K and K' high-symmetry points in monolayer transition metal dichalcogenides (TMDs) has potential as an optically addressable degree of freedom in next-generation optoelectronics. However, intervalley scattering and relaxation of charge carriers leads to valley depolarization and limits practical applications. In addition, enhanced Coulomb interactions lead to pronounced excitonic effects that dominate the optical response and initial valley depolarization dynamics but complicate the interpretation of ultrafast spectroscopic experiments at short time delays. Employing broadband helicity-resolved two-dimensional electronic spectroscopy (2DES), we observe ultrafast (∼10 fs) intervalley coupling between all A and B valley exciton states that results in a complete breakdown of the valley index in large-area monolayer MoS films. These couplings and subsequent dynamics exhibit minimal excitation fluence or temperature dependence and are robust toward changes in sample grain size and inherent strain. Our observations strongly suggest that this direct intervalley coupling on the time scale of optical excitation is an inherent property of large-area MoS distinct from dynamic carrier or exciton scattering, phonon-driven processes, and multiexciton effects. This ultrafast intervalley coupling poses a fundamental challenge for exciton-based valleytronics in monolayer TMDs and must be overcome to fully realize large-area valleytronic devices.

摘要

单层过渡金属二卤化物(TMDs)中K和K'高对称点处的能谷赝自旋,在下一代光电子学中具有作为光学可寻址自由度的潜力。然而,能谷间散射和电荷载流子的弛豫会导致能谷去极化,并限制实际应用。此外,增强的库仑相互作用会导致显著的激子效应,这种效应主导了光学响应和初始能谷去极化动力学,但会使短时间延迟下超快光谱实验的解释变得复杂。利用宽带螺旋度分辨二维电子光谱(2DES),我们观察到所有A和B能谷激子态之间的超快(~10 fs)能谷间耦合,这导致大面积单层MoS薄膜中能谷指数完全崩溃。这些耦合及随后的动力学表现出最小的激发通量或温度依赖性,并且对样品晶粒尺寸和固有应变的变化具有鲁棒性。我们的观察结果强烈表明,这种在光激发时间尺度上的直接能谷间耦合是大面积MoS的固有特性,不同于动态载流子或激子散射、声子驱动过程以及多激子效应。这种超快能谷间耦合对单层TMDs中基于激子的谷电子学构成了根本性挑战,必须克服这一挑战才能全面实现大面积谷电子器件。

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