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高透光多层5 mol%氧化钇稳定氧化锆的快速烧结和上釉效果对其弯曲强度和微观结构的体外评估

In Vitro Evaluation of Speed Sintering and Glazing Effects on the Flexural Strength and Microstructure of Highly Translucent Multilayered 5 mol% Yttria-Stabilized Zirconia.

作者信息

Jeong Ji-In, Kwon Yong-Hoon, Seol Hyo-Joung

机构信息

Department of Dental Materials, School of Dentistry, Pusan National University, Yangsan-si 626-814, Republic of Korea.

出版信息

Materials (Basel). 2024 Sep 21;17(18):4634. doi: 10.3390/ma17184634.

Abstract

This study aimed to investigate the impact of speed sintering and glazing on the flexural strength and microstructure of multilayered 5 mol% yttria-stabilized (5Y-) zirconia, which remains unknown. Bar-shaped specimens (N = 600) were fabricated from 5Y-zirconia (FX; Ceramill Zolid FX ML, ST; Katana STML) by cutting, polishing, sintering (conventional and speed sintering), and then glazing. A flexural strength test (n = 30/group), field emission scanning electron microscopy (FE-SEM) observation (n = 2/group), and an X-ray diffraction (XRD) study with Rietveld refinement (n = 1/group) were performed. The flexural strength was analyzed using three-way ANOVA and a post hoc Scheffé test. The grain size was analyzed using the Kruskal-Wallis H test and Bonferroni-Dunn post hoc test. Flexural strength slightly decreased in the nonglazed FX after speed sintering ( < 0.05). Glazing with and without glazing paste did not affect flexural strength at both sintering speeds ( > 0.05). Speed sintering and glazing minimally changed the Weibull modulus and phase fraction, and did not affect grain size ( > 0.05). ST had a larger grain size and lower tetragonal phase content than FX and had a lower flexural strength than FX in most groups ( < 0.05). Overall, the multilayered 5Y-zirconia is considered suitable for dental application using speed sintering and glazing.

摘要

本研究旨在调查快速烧结和上釉对多层5摩尔%氧化钇稳定(5Y-)氧化锆的抗弯强度和微观结构的影响,目前这方面尚不清楚。通过切割、抛光、烧结(传统烧结和快速烧结),然后上釉,用5Y-氧化锆(FX;Ceramill Zolid FX ML,ST;Katana STML)制作条形试样(N = 600)。进行了抗弯强度测试(n = 30/组)、场发射扫描电子显微镜(FE-SEM)观察(n = 2/组)以及采用Rietveld精修的X射线衍射(XRD)研究(n = 1/组)。使用三因素方差分析和事后Scheffé检验分析抗弯强度。使用Kruskal-Wallis H检验和Bonferroni-Dunn事后检验分析晶粒尺寸。快速烧结后,未上釉的FX的抗弯强度略有下降(<0.05)。在两种烧结速度下,使用和不使用釉浆上釉均不影响抗弯强度(>0.05)。快速烧结和上釉对韦布尔模量和相分数的影响最小,且不影响晶粒尺寸(>0.05)。与FX相比,ST的晶粒尺寸更大,四方相含量更低,并且在大多数组中其抗弯强度低于FX(<0.05)。总体而言,多层5Y-氧化锆被认为适用于采用快速烧结和上釉的牙科应用。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/bd1b/11433405/664ccd78f818/materials-17-04634-g001.jpg

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