Li Haonan, Zhang Muyang, Liu Yeqian, Yu Shangneng, Li Xionghui, Chen Zejingqiu, Feng Zitao, Zhou Jie, He Qinghao, Chen Xinyi, Zhang Huiru, Zhang Jiaen, Zhang Xingwei, Guo Weijin
Department of Electrical Engineering, Shantou University, Shantou 515063, China.
Department of Biomedical Engineering, Shantou University, Shantou 515063, China.
Micromachines (Basel). 2024 Aug 28;15(9):1088. doi: 10.3390/mi15091088.
Superhydrophobic surfaces have been used in various fields of engineering due to their resistance to corrosion and fouling and their ability to control fluid movement. Traditionally, superhydrophobic surfaces are fabricated via chemical methods of changing the surface energy or mechanical methods of controlling the surface topology. Many of the conventional mechanical methods use a top-to-bottom scheme to control the surface topolopy. Here, we develop a novel fabrication method of superhydrophobic substrates using a bottom-to-top scheme via polymer OSTE, which is a prototyping polymer material developed for the fabrication of microchips due to its superior photocuring ability, mechanical properties, and surface modification ability. We fabricate a superhydrophobic substrate by OSTE-OSTE micro mushroom forest via a two-step lithography process. At first, we fabricate an OSTE pillar forest as the mushroom stems; then, we fabricate the mushroom heads via backside lithography with diffused UV light. Such topology and surface properties of OSTE render these structures superhydrophobic, with water droplets reaching a contact angle of 152.9 ± 0.2°, a sliding angle of 4.1°, and a contact angle hysteresis of less than 0.5°. These characteristics indicate the promising potential of this substrate for superhydrophobic applications.
超疏水表面因其耐腐蚀、抗污染以及控制流体运动的能力而被应用于各个工程领域。传统上,超疏水表面是通过改变表面能的化学方法或控制表面拓扑结构的机械方法制造的。许多传统的机械方法采用自上而下的方案来控制表面拓扑结构。在此,我们开发了一种新颖的超疏水基底制造方法,通过聚合物OSTE采用自下而上的方案,OSTE是一种用于制造微芯片的原型聚合物材料,因其优异的光固化能力、机械性能和表面改性能力而被开发。我们通过两步光刻工艺,利用OSTE-OSTE微蘑菇林制造了一种超疏水基底。首先,我们制造了作为蘑菇茎的OSTE柱林;然后,我们通过背面光刻和漫射紫外光制造蘑菇头。OSTE的这种拓扑结构和表面性质使这些结构具有超疏水性,水滴的接触角达到152.9±0.2°,滑动角为4.1°,接触角滞后小于0.5°。这些特性表明这种基底在超疏水应用方面具有广阔的潜力。