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硫空位对单层二硫化钼光响应性的氧化诱导调制。

Oxidation-induced modulation of photoresponsivity in monolayer MoS with sulfur vacancies.

作者信息

Abidi Irfan H, Bhoriya Ankit, Vashishtha Pargam, Giridhar Sindhu Priya, Mayes Edwin L H, Sehrawat Manoj, Verma Ajay Kumar, Aggarwal Vishnu, Gupta Tanish, Singh H K, Ahmed Taimur, Dilawar Sharma Nita, Walia Sumeet

机构信息

School of Engineering, RMIT University, 124 La Trobe Street, Melbourne, Victoria 3001, Australia.

CSIR-National Physical Laboratory, Dr K.S. Krishnan Marg, New Delhi 110012, India.

出版信息

Nanoscale. 2024 Oct 31;16(42):19834-19843. doi: 10.1039/d4nr02518k.

Abstract

Two-dimensional transition metal dichalcogenides (TMDs), such as MoS, hold great promise for next-generation electronics and optoelectronics due to their unique properties. However, the ultrathin nature of these materials renders them vulnerable to structural defects and environmental factors, which significantly impact their performance. Sulfur vacancies (V) are the most common intrinsic defects in MoS, and their impact on device performance in oxidising environments remains understudied. This study investigates the impact of V defects on the photoresponsivity of CVD-grown monolayer MoS devices, when exposed to oxidising environments at high temperatures. Our findings reveal a dynamic process of defect generation and healing through oxygen passivation, leading to a significant difference in photocurrent between environments. Temperature-dependent analysis shows defect healing and a notable reduction in defect density upon cooling. This study provides crucial insights into the stability and performance of 2D materials-based devices under varying environmental conditions, essential for designing and controlling the performance of TMD-based devices. Our results pave the way for the development of robust and reliable 2D materials-based electronics and optoelectronics.

摘要

二维过渡金属二硫属化物(TMDs),如二硫化钼(MoS₂),因其独特的性质,在下一代电子学和光电子学领域具有巨大潜力。然而,这些材料的超薄特性使其易受结构缺陷和环境因素的影响,这对其性能有显著影响。硫空位(VS)是二硫化钼中最常见的固有缺陷,其在氧化环境中对器件性能的影响仍未得到充分研究。本研究调查了在高温氧化环境下,VS缺陷对化学气相沉积生长的单层二硫化钼器件光响应性的影响。我们的研究结果揭示了通过氧钝化产生和修复缺陷的动态过程,导致不同环境下光电流存在显著差异。温度依赖性分析表明,冷却时缺陷会修复且缺陷密度显著降低。本研究为理解二维材料基器件在不同环境条件下的稳定性和性能提供了关键见解,这对于设计和控制基于TMD的器件性能至关重要。我们的结果为开发坚固可靠的二维材料基电子学和光电子学铺平了道路。

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