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应变和静电掺杂对GaN/ VTe范德华异质结构磁各向异性影响的研究

Study on the effects of strain and electrostatic doping on the magnetic anisotropy of GaN/VTevan der waals heterostructure.

作者信息

Xue Junjun, Chen Wei, Hu Shanwen, Chen Zhouyu, Fang Haoyu, Zhi Ting, Shao Pengfei, Cai Qing, Yang Guofeng, Gu Yan, Wang Jin, Chen Dunjun

机构信息

College of Electronic and Optical Engineering & College of Flexible Electronics (Future Technology), Nanjing University of Posts and Telecommunications, Nanjing 210023, People's Republic of China.

National and Local Joint Engineering Laboratory of RF Integration and Micro-Assembly Technology, Nanjing 210023, People's Republic of China.

出版信息

Nanotechnology. 2024 Oct 16;36(1). doi: 10.1088/1361-6528/ad8450.

DOI:10.1088/1361-6528/ad8450
PMID:39378893
Abstract

Using a first-principles approach, this study delves into the effects of strain and electrostatic doping on the electronic and magnetic properties of the GaN/VTevan der Waals (vdW) heterostructure. The results reveal that when the GaN/VTevdW heterostructure is doped with 0.1/0.2of electrostatic charge, its magnetization direction undergoes a remarkable reversal, shifting from out-of-plane orientation to in-plane direction. Therefore, we conduct a thorough investigation into the influence of electron orbitals on magnetic anisotropy energy. In addition, as the strain changes from -1% to 1%, the 100% spin polarization region of the GaN/VTevdW heterostructure becomes smaller. It is worth noting that at a doping concentration of 0.1, the GaN/VTevdW heterostructure has a Curie temperature of 30 K above room temperature. This comprehensive study provides valuable insights and provides a reference for analyzing the electronic and magnetic properties of low-dimensional systems.

摘要

本研究采用第一性原理方法,深入探究应变和静电掺杂对GaN/VTe范德华(vdW)异质结构的电子和磁性能的影响。结果表明,当GaN/VTe vdW异质结构掺杂0.1/0.2的静电荷时,其磁化方向发生显著反转,从面外取向转变为面内方向。因此,我们深入研究了电子轨道对磁各向异性能的影响。此外,随着应变从-1%变化到1%,GaN/VTe vdW异质结构的100%自旋极化区域变小。值得注意的是,在掺杂浓度为0.1时,GaN/VTe vdW异质结构的居里温度比室温高30K。这项综合研究提供了有价值的见解,并为分析低维系统的电子和磁性能提供了参考。

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