Yakushev A, Khuyagbaatar J, Düllmann Ch E, Block M, Cantemir R A, Cox D M, Dietzel D, Giacoppo F, Hrabar Y, Iliaš M, Jäger E, Krier J, Krupp D, Kurz N, Lens L, Löchner S, Mokry Ch, Mošať P, Pershina V, Raeder S, Rudolph D, Runke J, Sarmiento L G, Schausten B, Scherer U, Thörle-Pospiech P, Trautmann N, Wegrzecki M, Wieczorek P
GSI Helmholtzzentrum für Schwerionenforschung, Darmstadt, Germany.
Helmholtz-Institut Mainz, Mainz, Germany.
Front Chem. 2024 Sep 23;12:1474820. doi: 10.3389/fchem.2024.1474820. eCollection 2024.
Chemical reactivity of the superheavy elements nihonium (Nh, element 113) and moscovium (Mc, element 115) has been studied by the gas-solid chromatography method using a new combined chromatography and detection setup. The Mc isotope, Mc, was produced in the nuclear fusion reaction of Ca ions with Am targets at the GSI Helmholtzzentrum Darmstadt, Germany. After isolating Mc ions in the gas-filled separator TASCA, adsorption of Mc and its decay product Nh on silicon oxide and gold surfaces was investigated. As a result of this work, the values of the adsorption enthalpy of Nh and Mc on the silicon oxide surface were determined for the first time, kJ/mol and kJ/mol (68% c.i.). The obtained -Δ values are in good agreement with results of advanced relativistic calculations. Both elements, Nh and Mc, were shown to interact more weakly with the silicon oxide surface than their lighter homologues Tl and Bi, respectively. However, Nh and Mc turned out to be more reactive than the neighbouring closed-shell and quasi-closed-shell elements copernicium (Cn, element 112) and flerovium (Fl, element 114), respectively. The established trend is explained by the influence of strong relativistic effects on the valence atomic orbitals of these elements.
利用一种新的色谱与检测联用装置,通过气固色谱法研究了超重元素 nihonium(Nh,113 号元素)和 moscovium(Mc,115 号元素)的化学反应性。Mc 同位素,即(^{288}Mc),是在德国达姆施塔特的 GSI 亥姆霍兹中心,通过钙离子与镅靶的核聚变反应产生的。在充气分离器 TASCA 中分离出 Mc 离子后,研究了 Mc 及其衰变产物 Nh 在氧化硅和金表面的吸附情况。这项工作的结果首次确定了 Nh 和 Mc 在氧化硅表面的吸附焓值,分别为(kJ/mol)和(kJ/mol)(置信区间为 68%)。所得到的(-\Delta H)值与先进的相对论计算结果高度吻合。结果表明,Nh 和 Mc 这两种元素与氧化硅表面的相互作用分别比它们较轻的同系物铊(Tl)和铋(Bi)弱。然而,Nh 和 Mc 分别比相邻的闭壳层和准闭壳层元素鎶(Cn,112 号元素)和鉝(Fl,114 号元素)更具反应活性。这种既定趋势是由强相对论效应对这些元素价原子轨道的影响所解释的。