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通过金属钾还原芳基异氰酸酯和三芳基异氰脲酸酯形成联芳基阴离子自由基

Biaryl Anion Radical Formation by Potassium Metal Reduction of Aryl Isocyanates and Triaryl Isocyanurates.

作者信息

Peters Steven J, Kennedy Sean H, Christiansen Colton J

机构信息

Department of Chemistry, Illinois State University, Normal, Illinois 61790-4160, United States.

出版信息

J Org Chem. 2024 Nov 1;89(21):15708-15717. doi: 10.1021/acs.joc.4c01844. Epub 2024 Oct 13.

Abstract

The potassium metal reduction of aryl isocyanates (aryl = phenyl, -tolyl, 3,5-dimethylphenyl, 4-biphenylyl, and 1-naphthyl) in THF with 18-crown-6 or in HMPA results in the formation of the corresponding triaryl isocyanurate anion radicals. Continued exposure to potassium results in loss of the isocyanurate anion radical and the eventual formation of the respective biaryl anion radical. The 1,1'-binaphthyl anion radical is found to undergo a cyclodehydrogenation reaction, which leads to formation of the perylene anion radical. When authentic triaryl isocyanurates are reduced with metal, the heterocyclic ring undergoes fragmentation with elimination of carbon monoxide to produce a triarylbiuret dianion. This ring opening reaction is initiated by the two-electron reduction of the neutral isocyanurate species. The biaryl anion radical is formed when the biuret dianion is reduced further with metal. A possible mechanism for biaryl formation involves a heterolytic cleavage of an aryl C-N bond and release of an aryl radical once the triarylbiuret dianion is further reduced. A subsequent intermolecular reaction between two aryl radicals forms the corresponding biaryl, which can then be reduced to the anion radical. Notably, when a mixture of two different triaryl isocyanurate compounds is reduced in solution, the corresponding mixed biaryl anion radical is generated.

摘要

在四氢呋喃(THF)中,使用18 - 冠 - 6或在六甲基磷酰胺(HMPA)中,用金属钾还原芳基异氰酸酯(芳基 = 苯基、对甲苯基、3,5 - 二甲基苯基、4 - 联苯基和1 - 萘基)会生成相应的三芳基异氰尿酸酯阴离子自由基。持续与钾接触会导致异氰尿酸酯阴离子自由基消失,并最终形成各自的联芳基阴离子自由基。发现1,1'-联萘基阴离子自由基会发生环脱氢反应,生成苝阴离子自由基。当用金属还原纯正的三芳基异氰尿酸酯时,杂环会发生断裂并消除一氧化碳,生成三芳基缩二脲二价阴离子。这种开环反应是由中性异氰尿酸酯物种的双电子还原引发的。当缩二脲二价阴离子进一步用金属还原时,会形成联芳基阴离子自由基。联芳基形成的一种可能机制涉及芳基C - N键的异裂,一旦三芳基缩二脲二价阴离子进一步还原,就会释放出一个芳基自由基。随后,两个芳基自由基之间的分子间反应形成相应的联芳基,然后联芳基可被还原为阴离子自由基。值得注意的是,当在溶液中还原两种不同的三芳基异氰尿酸酯化合物的混合物时,会生成相应的混合联芳基阴离子自由基。

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