Liu Fei, Xu Haochong, Pan Honggang, Lai Zhanyun, Zhang Yuanyuan, Zhang Ailing
Engineering Research Center of Communication Devices and Technology, Ministry of Education, Tianjin Key Laboratory of Film Electronic and Communication Devices, School of Integrated Circuit Science and Engineering, Tianjin University of Technology, Tianjin 300384, China.
Dalton Trans. 2024 Nov 19;53(45):18313-18320. doi: 10.1039/d4dt02032d.
In this paper, a tunable and ultra-broadband terahertz (THz) absorber is proposed. The absorber, which is built upon the conventional metal-dielectric-metal tri-layer configuration, incorporates a KCl thin film within the dielectric gap situated between the top resonator and the middle dielectric layer. The simulation indicates that the absorber effectively captures more than 90% of terahertz waves between 3.6 and 7.3 THz, achieving absorption of over 99% within the 5.8-6.9 THz range. This unique broadband absorber is enabled by the interaction of plasmon and epsilon-near-zero (ENZ) modes. Additionally, due to the utilization of VO in the top resonator, the designed absorber holds potential to function as a thermally controlled radiation emitter, exhibiting a high emissivity of 90.5% at high temperatures while maintaining a low emissivity of 8.2% at low temperatures. The absorber is uncomplicated and adjustable, offering great potential for use in thermal management, terahertz camouflage, and engineering insulation.
本文提出了一种可调谐超宽带太赫兹(THz)吸收器。该吸收器基于传统的金属-电介质-金属三层结构构建,在顶部谐振器和中间电介质层之间的电介质间隙中包含一层KCl薄膜。模拟表明,该吸收器能有效捕获3.6至7.3太赫兹之间超过90%的太赫兹波,在5.8至6.9太赫兹范围内实现超过99%的吸收。这种独特的宽带吸收器是由等离子体和近零介电常数(ENZ)模式的相互作用实现的。此外,由于顶部谐振器中使用了VO,所设计的吸收器有潜力用作热控辐射发射器,在高温下具有90.5%的高发射率,而在低温下保持8.2%的低发射率。该吸收器结构简单且可调谐,在热管理、太赫兹伪装和工程绝缘方面具有巨大的应用潜力。