Qin Ge, Li Shiwei, Li Meng, Peng Haoyu, Niu Shen, Li Xinchao, Liu Huan, Yan Liang, Ming Pingmei
School of Mechanical and Power Engineering, Henan Polytechnic University, Jiaozuo 454000, China.
Micromachines (Basel). 2024 Oct 12;15(10):1253. doi: 10.3390/mi15101253.
GH4169 alloy, a nickel-based superalloy known for its excellent high temperature resistance, corrosion resistance, mechanical properties, and high-temperature tribological properties, is widely used in industrial applications, such as in gas turbines for space shuttles and rocket engines. This study addresses the issue of electrolyte product residue in the electrochemical machining process of a GH4169 alloy by utilizing a CHNaO-containing NaNO new mixed electrolyte. Comparative investigations of the electrochemical behavior and electrolyte product removal mechanisms at different concentrations of CHNaO additive in NaNO solutions were conducted. The effects of additives, applied voltage, and the rotating speed of the cathode tool on the processing performance of micro-pit arrays on a GH4169 alloy were analyzed. The results indicate that the mixed solution containing CHNaO significantly improves the localization and geometric morphology of the micro-pits compared to a single NaNO solution. The optimal electrochemical machining parameters were identified as 0.5 wt% CHNaO + 10 wt% NaNO mixed electrolyte, 12 V applied voltage, and 0.1 r/min rotating speed of the cathode tool. Under these conditions, high-quality micro-pit arrays with an average diameter of 405.85 μm, an average depth of 87.5 μm, and an etch factor (EF) of 1.67 were successfully fabricated, exhibiting excellent morphology, localization, and consistency.
GH4169合金是一种镍基高温合金,以其优异的耐高温性、耐腐蚀性、机械性能和高温摩擦学性能而闻名,广泛应用于工业领域,如航天飞机的燃气轮机和火箭发动机。本研究通过使用含CHNaO的NaNO新型混合电解液,解决了GH4169合金电化学加工过程中电解液产物残留的问题。对不同浓度的CHNaO添加剂在NaNO溶液中的电化学行为和电解液产物去除机制进行了对比研究。分析了添加剂、施加电压和阴极工具转速对GH4169合金微坑阵列加工性能的影响。结果表明,与单一NaNO溶液相比,含CHNaO的混合溶液显著改善了微坑的局部化和几何形态。确定最佳电化学加工参数为0.5 wt% CHNaO + 10 wt% NaNO混合电解液、12 V施加电压和0.1 r/min阴极工具转速。在此条件下,成功制备出平均直径为405.85μm、平均深度为87.5μm、蚀刻因子(EF)为1.67的高质量微坑阵列,具有优异的形态、局部化和一致性。