Pei Shengyu, Li Jian, Bai Zhenquan, Wang Chen, Lv Xianghong
College of New Energy, Xi'an Shiyou University, Xi'an, 710065, China.
School of Materials Science and Engineering, Xi'an Shiyou University, Xi'an, 710065, China.
J Mol Model. 2024 Nov 30;30(12):422. doi: 10.1007/s00894-024-06227-1.
Battery interface research can effectively guide battery design and material selection to improve battery performance. However, current electrode material interface studies still have significant limitations. In this paper, by employing DFT-D method, the influences of doping elements (boron, nitrogen, phosphorus, sulfur, and silicon) on the properties of C fullerene, such as structural stability, electronic properties, and the adsorption and migration of lithium ion, are comprehensively investigated. It is demonstrated that doping can bolster the fullerene molecule's structural integrity and enhance charge transfer comparing with C, thereby augmenting the material's electrical conductivity. Among the five doping elements, B-doping exhibits the most favorable adsorption energies, indicating a strong lithium binding affinity. This observation is supported with energy barrier of lithium ion migration. B-doping leads to an elevated barrier (0.37 eV) comparing with pristine C (0.19 eV), whereas Si-doping significantly reduced barrier (0.038 eV) indicates enhanced lithium-ion mobility. These findings solid the efficacy of doping as a strategy to enhance the performance of fullerene electrodes.
All DFT calculations were performed using the VASP software package. The chosen computational technique was a combination of the generalized approximate gradient function PBE with the dispersion correction (DFT-D3) developed by Grimme. The results of the calculations were analyzed with the help of VASPKIT.
电池界面研究能够有效指导电池设计和材料选择,以提升电池性能。然而,当前电极材料界面研究仍存在显著局限性。本文采用密度泛函理论-色散校正(DFT-D)方法,全面研究了掺杂元素(硼、氮、磷、硫和硅)对C富勒烯性质的影响,如结构稳定性、电子性质以及锂离子的吸附和迁移。结果表明,与C相比,掺杂能够增强富勒烯分子的结构完整性并促进电荷转移,从而提高材料的电导率。在这五种掺杂元素中,B掺杂表现出最有利的吸附能,表明其对锂具有较强的结合亲和力。锂离子迁移的能垒也证实了这一观察结果。与原始C(0.19 eV)相比,B掺杂导致能垒升高(0.37 eV),而Si掺杂显著降低了能垒(0.038 eV),这表明锂离子迁移率增强。这些发现证实了掺杂作为一种提高富勒烯电极性能策略的有效性。
所有DFT计算均使用VASP软件包进行。所选用的计算技术是广义梯度近似函数PBE与Grimme开发的色散校正(DFT-D3)的组合。计算结果借助VASPKIT进行分析。