Lee Woncheol, Alvertis Antonios M, Li Zhenglu, Louie Steven G, Filip Marina R, Neaton Jeffrey B, Kioupakis Emmanouil
Department of Electrical Engineering and Computer Science, <a href="https://ror.org/00jmfr291">University of Michigan</a>, Ann Arbor, Michigan 48109, USA.
KBR, Inc. <a href="https://ror.org/02acart68">NASA Ames Research Center</a>, Moffett Field, California 94035, USA.
Phys Rev Lett. 2024 Nov 15;133(20):206901. doi: 10.1103/PhysRevLett.133.206901.
Atomically thin semiconductors, encompassing both 2D materials and quantum wells, exhibit a pronounced enhancement of excitonic effects due to geometric confinement. Consequently, these materials have become foundational platforms for the exploration and utilization of excitons. Recent ab initio studies have demonstrated that phonons can substantially screen electron-hole interactions in bulk semiconductors and strongly modify the properties of excitons. While excitonic properties of atomically thin semiconductors have been the subject of extensive theoretical investigations, the role of phonon screening on excitons in atomically thin structures remains unexplored. In this Letter, we demonstrate via ab initio GW-Bethe-Salpeter equation calculations that phonon screening can have a significant impact on optical excitations in atomically thin semiconductors. We further show that the degree of phonon screening can be tuned by structural engineering. We focus on atomically thin GaN quantum wells embedded in AlN and identify specific phonons in the surrounding material, AlN, that dramatically alter the lowest-lying exciton in monolayer GaN via screening. Our studies provide new intuition beyond standard models into the interplay among structural properties, phonon characteristics, and exciton properties in atomically thin semiconductors, and have implications for future experiments.
原子级薄的半导体,包括二维材料和量子阱,由于几何限制而表现出明显增强的激子效应。因此,这些材料已成为激子探索和利用的基础平台。最近的从头算研究表明,声子可以在体半导体中显著屏蔽电子-空穴相互作用,并强烈改变激子的性质。虽然原子级薄半导体的激子性质一直是广泛理论研究的主题,但声子屏蔽在原子级薄结构中对激子的作用仍未得到探索。在本信函中,我们通过从头算GW-贝特-萨尔皮特方程计算表明,声子屏蔽可以对原子级薄半导体中的光学激发产生显著影响。我们进一步表明,声子屏蔽程度可以通过结构工程来调节。我们聚焦于嵌入在AlN中的原子级薄GaN量子阱,并识别出周围材料AlN中的特定声子,这些声子通过屏蔽显著改变了单层GaN中最低的激子。我们的研究为原子级薄半导体的结构性质、声子特性和激子性质之间的相互作用提供了超越标准模型的新见解,并对未来的实验具有启示意义。