Cui Xiangpeng, Huo Wenjun, Qiu Linlu, Zhao Likang, Wang Junjie, Lou Fei, Zhang Shuaiyi, Khayrudinov Vladislav, Tam Wing Yim, Lipsanen Harri, Yang He, Wang Xia
Shandong Engineering Research Center of New Optoelectronic Information Technology and Devices, School of Mathematics and Physics, Qingdao University of Science & Technology, Qingdao 266061, China.
Department of Electronics and Nanoengineering, Aalto University, Espoo FI-00076, Finland.
Nanophotonics. 2024 Mar 13;13(13):2379-2389. doi: 10.1515/nanoph-2023-0948. eCollection 2024 May.
Gallium arsenide (GaAs) semiconductor wires have emerged as potent candidates for nonlinear optical devices, necessitating bandgap engineering for an expanded operational wavelength range. We report the successful growth of strain-mediated GaAs microwires (MWs) with an average diameter of 1.1 μm. The axial tensile strain in these wires, as measured by X-ray diffraction and Raman scattering, ranges from 1.61 % to 1.95 % and from 1.44 % to 2.03 %, respectively. This strain condition significantly reduces the bandgap of GaAs MWs compared to bulk GaAs, enabling a response wavelength extension up to 1.1 μm. Open aperture Z-scan measurements reveal a nonlinear absorption coefficient of -15.9 cm/MW and a third-order magnetic susceptibility of -2.8 × 10 esu at 800 nm for these MWs. I-scan measurements further show that the GaAs saturable absorber has a modulation depth of 7.9 % and a nonsaturation loss of 3.3 % at 1050 nm. In laser applications, GaAs MWs have been effectively used as saturable absorbers for achieving Q-switched and dual-wavelength synchronous mode-locking operations in Yb-bulk lasers. These results not only offer new insights into the use of large diameter semiconductor wires but also expand the potential for applications requiring bandgap tuning.
砷化镓(GaAs)半导体线已成为非线性光学器件的有力候选材料,这就需要进行带隙工程以扩大工作波长范围。我们报告了成功生长出平均直径为1.1μm的应变介导GaAs微线(MWs)。通过X射线衍射和拉曼散射测量,这些微线中的轴向拉伸应变分别为1.61%至1.95%和1.44%至2.03%。与块状GaAs相比,这种应变条件显著降低了GaAs MWs的带隙,使响应波长扩展至1.1μm。开孔Z扫描测量显示,对于这些MWs,在800nm处的非线性吸收系数为-15.9cm/MW,三阶磁化率为-2.8×10esu。I扫描测量进一步表明,GaAs可饱和吸收体在1050nm处的调制深度为7.9%,非饱和损耗为3.3%。在激光应用中,GaAs MWs已被有效地用作可饱和吸收体,以实现Yb块状激光器中的调Q和双波长同步锁模操作。这些结果不仅为大直径半导体线的应用提供了新的见解,也扩展了需要带隙调谐的应用潜力。