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横向磁拓扑异质结构中的稳健拓扑界面态

Robust Topological Interface States in a Lateral Magnetic-Topological Heterostructure.

作者信息

Niu Qun, Yao Jie, Song Quanchao, Akber Humaira, Zhou Qin, Zhai Xiaofang, Zhao Aidi

机构信息

School of Physical Science and Technology, ShanghaiTech University, Shanghai, 201210, China.

Department of Chemical Physics, University of Science and Technology of China, Hefei, Anhui, 230026, China.

出版信息

Small. 2025 Feb;21(8):e2409979. doi: 10.1002/smll.202409979. Epub 2024 Dec 11.

DOI:10.1002/smll.202409979
PMID:39663720
Abstract

Introducing uniform magnetic order in two-dimensional (2D) topological insulators by constructing heterostructures of TI and magnet is a promising way to realize the high-temperature Quantum Anomalous Hall effect. However, the topological properties of 2D materials are susceptible to several factors that make them difficult to maintain, and whether topological interface states (TISs) can exist at magnetic-topological heterostructure interfaces is largely unknown. Here, it is experimentally shown that TISs in a lateral heterostructure of CrTe/Bi(110) are robust against disorder, defects, high magnetic fields (time-reversal symmetry-breaking perturbations), and elevated temperature (77 K). The lateral heterostructure is realized by lateral epitaxial growth of bilayer (BL) Bi to monolayer CrTe grown on graphite. Scanning Tunneling Microscopy and non-contact Atomic Force Microscopy demonstrate a black phosphorus-like structure with low atomic buckling (less than 0.1 Å) of the BL Bi(110), indicating the presence of its topological properties. Scanning tunneling spectroscopy and energy-dependent dI/dV mapping further confirm the existence of topologically induced one-dimensional in-gap states localized at the interface. These results demonstrate the robustness of TISs in lateral magnetic-topological heterostructures, which is competitive with those in vertically stacked magnetic-topological heterostructures and provides a promising route for constructing planar high-density non-dissipative devices using TISs.

摘要

通过构建拓扑绝缘体(TI)与磁体的异质结构在二维(2D)拓扑绝缘体中引入均匀磁序是实现高温量子反常霍尔效应的一种有前途的方法。然而,二维材料的拓扑性质易受多种因素影响,难以维持,并且磁拓扑异质结构界面处是否能存在拓扑界面态(TISs)在很大程度上尚不清楚。在此,实验表明CrTe/Bi(110)横向异质结构中的TISs对无序、缺陷、高磁场(时间反演对称性破缺微扰)和高温(77 K)具有鲁棒性。该横向异质结构是通过在石墨上生长的双层(BL)Bi向单层CrTe的横向外延生长实现的。扫描隧道显微镜和非接触原子力显微镜显示了BL Bi(110)具有低原子起伏(小于0.1 Å)的类似黑磷的结构,表明其拓扑性质的存在。扫描隧道谱和能量依赖的dI/dV映射进一步证实了位于界面处的拓扑诱导一维能隙态的存在。这些结果证明了横向磁拓扑异质结构中TISs的鲁棒性,其与垂直堆叠的磁拓扑异质结构中的TISs具有竞争力,并为使用TISs构建平面高密度无耗散器件提供了一条有前途的途径。

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