Bilotto Pierluigi, Miano Daniela, Celebi Alper Tunga, Valtiner Markus
CEST GmbH, Centre for Electrochemical Surface Technology, A-2700, Wiener Neustadt, Austria.
Applied Interface Physics, TU Wien, A-1040, Vienna, Austria.
Langmuir. 2024 Dec 31;40(52):27127-27136. doi: 10.1021/acs.langmuir.4c02862. Epub 2024 Dec 16.
The swift progression of technology in electronic fabrication is adhering to a trend of miniaturization, descending to the nanoscale. Surface contaminants, such as nanoparticles, can influence the performance of silicon wafers, thereby necessitating the evolution of novel cleaning methodologies. Surface nanobubbles (SNs) are phenomena that have attracted considerable attention over the past decade. A salient feature of SNs is their capacity to eliminate nanoparticles from silicon wafers. In this Perspective, our objective is to scrutinize whether this capability can be unequivocally ascribed to SNs. Initially, we offer a succinct elucidation of the nature of SNs; subsequently, we evaluate the claims regarding the cleaning efficacy of SNs; finally, we present our interpretation of the operative forces and propose potential scenarios of the interaction between SNs and nanoparticles. Consequently, the aim of this Perspective is to emphasize the significance of comprehending the interaction between SNs and nanoparticles with the intent to delineate new research trajectories bearing both fundamental and industrial ramifications.
电子制造技术的迅速发展正遵循着一种小型化趋势，缩小到纳米尺度。诸如纳米颗粒之类的表面污染物会影响硅片的性能，因此需要开发新的清洁方法。表面纳米气泡（SNs）是过去十年中备受关注的现象。SNs的一个显著特征是它们能够从硅片上去除纳米颗粒。在这篇观点文章中，我们的目标是仔细研究这种能力是否能明确归因于SNs。首先，我们简要阐述SNs的性质；随后，我们评估关于SNs清洁效果的说法；最后，我们给出对作用力的解释，并提出SNs与纳米颗粒之间相互作用的潜在情形。因此，这篇观点文章的目的是强调理解SNs与纳米颗粒之间相互作用的重要性，以便描绘出具有基础和工业意义的新研究轨迹。
