Pappaianni Giulio, Montanari Francesco, Bonechi Marco, Zangari Giovanni, Giurlani Walter, Innocenti Massimo
Dipartimento di Chimica "Ugo Schiff", Università degli Studi di Firenze, Via della Lastruccia 3, 50019 Sesto Fiorentino, Italy.
Consorzio Interuniversitario Nazionale per la Scienza e Tecnologia dei Materiali (INSTM), Via G. Giusti 9, 50121 Florence, Italy.
Nanomaterials (Basel). 2024 Dec 20;14(24):2042. doi: 10.3390/nano14242042.
In this study, we investigate the electrodeposition of various metals on silicon. Mn, Co, Ni, Ru, Pd, Rh, and Pt were identified as promising candidates for controlled electrodeposition onto silicon. Electrochemical evaluations employing cyclic voltammetry, Scanning Electron Microscopy (SEM) associated with energy-dispersive X-Ray Spectroscopy (SEM-EDS), and X-Ray Photoelectron Spectroscopy (XPS) techniques confirmed the deposition of Pd, Rh, and Pt as nanoparticles. Multi-cycle charge-controlled depositions were subsequently performed to evaluate the possibility of achieving tunable electrodeposition of nanostructured rhodium on n-doped silicon. The procedure increased surface coverage from 9% to 84%, with the average particle size diameter ranging from 57 nm to 168 nm, and with an equivalent thickness of the deposits up to 43.9 nm, varying the number of charge-controlled deposition cycles. The electrodeposition of rhodium on silicon presents numerous opportunities across various scientific and technological domains, driving innovation and enhancing the performance of devices and materials used in catalysis, electronics, solar cells, fuel cells, and sensing.
在本研究中，我们研究了各种金属在硅上的电沉积。锰、钴、镍、钌、钯、铑和铂被确定为有望可控电沉积到硅上的候选金属。采用循环伏安法、与能量色散X射线光谱联用的扫描电子显微镜（SEM-EDS）以及X射线光电子能谱（XPS）技术进行的电化学评估证实，钯、铑和铂以纳米颗粒形式沉积。随后进行了多循环电荷控制沉积，以评估在n型掺杂硅上实现纳米结构铑的可调谐电沉积的可能性。通过改变电荷控制沉积循环的次数，该过程使表面覆盖率从9%提高到84%，平均粒径范围为57纳米至168纳米，沉积物的等效厚度高达43.9纳米。铑在硅上的电沉积在各个科学和技术领域都带来了众多机遇，推动了创新，并提高了用于催化、电子、太阳能电池、燃料电池和传感的器件和材料的性能。
