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单层石墨烯促进还原氧化石墨烯的结构修复

Structural Repair of Reduced Graphene Oxide Promoted by Single-Layer Graphene.

作者信息

Guo Minghao, Yuan Hong, Ni Kun, Ye Chuanren, Pan Fei, Xiong Juan, Zhu Yanwu

机构信息

Hefei National Research Center for Physical Sciences at the Microscale, Department of Materials Science and Engineering, School of Chemistry and Materials Science, Key Laboratory of Precision and Intelligent Chemistry, University of Science and Technology of China, Hefei, Anhui, 230026, China.

出版信息

Adv Sci (Weinh). 2025 Feb;12(7):e2410088. doi: 10.1002/advs.202410088. Epub 2024 Dec 30.

Abstract

High-temperature graphitization of graphene oxide (GO) is a crucial step for enhancing interlayer stacking and repairing the in-plane defects of reduced graphene oxide (rGO) films. However, the fine control of the structural repair and reducing the energy consumption in thermal treatment remain challenges. In this study, ab-initio molecular dynamics simulations combined with experiments are used to investigate the structural evolution of rGO upon thermal annealing, with or without the presence of single-layer graphene (SLG). It is found that the SLG promotes the repair of the carbon honeycombed matrix and alleviates the release of carbon-containing groups during graphitization. Further electronic analysis reveals the crucial role of charge transfer from SLG to defective graphene in strengthening the C─C bonds. The result of Raman spectroscopy matches with the simulation, demonstrating an improved repairing degree of rGO upon contacting with SLG. This study provides a deeper understanding of the graphitization and repair mechanism of rGO, which may be useful for the highly efficient preparation of high-quality graphene films.

摘要

氧化石墨烯(GO)的高温石墨化是增强层间堆积和修复还原氧化石墨烯(rGO)薄膜面内缺陷的关键步骤。然而,精确控制结构修复以及降低热处理过程中的能耗仍然是挑战。在本研究中,结合实验使用从头算分子动力学模拟来研究有或没有单层石墨烯(SLG)存在时rGO在热退火过程中的结构演变。研究发现,SLG促进了碳蜂窝状基体的修复,并减轻了石墨化过程中含碳基团的释放。进一步的电子分析揭示了从SLG到有缺陷石墨烯的电荷转移在强化C─C键方面的关键作用。拉曼光谱结果与模拟结果相匹配,表明rGO与SLG接触后修复程度得到改善。本研究为rGO的石墨化和修复机制提供了更深入的理解,这可能有助于高质量石墨烯薄膜的高效制备。

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