Zhang Zhen, Li Fangpei, Peng Wenbo, Zhu Quanzhe, He Yongning
School of Microelectronics, Xi'an Jiaotong University, Xi'an 710049, China.
The Key Lab of Micro-Nano Electronics and System Integration of Xi'an City, Xi'an 710049, China.
Sensors (Basel). 2024 Dec 22;24(24):8197. doi: 10.3390/s24248197.
The combination of ZnO with narrow bandgap materials such as CuO is now a common method to synthesize high-performance optoelectronic devices. This study focuses on optimizing the performance of p-CuO/n-ZnO heterojunction pyroelectric photodetectors, fabricated through magnetron sputtering, by leveraging the pyro-phototronic effect. The devices' photoresponse to UV (365 nm) and visible (405 nm) lasers is thoroughly examined. The results show that when the device performance is regulated by adjusting the three parameters-sputtering power, sputtering time, and sputtering oxygen-argon ratio-the optimal sputtering parameters should be as follows: sputtering power of 120 W, sputtering time of 15 min, and sputtering oxygen-argon ratio of 1:3. With the optimal sputtering parameters, the maximum responsivity of the pyroelectric effect and the traditional photovoltaic effect Rpyro+photo of the detector is 4.7 times that under the basic parameters, and the maximum responsivity of the traditional photovoltaic effect Rphoto is also 5.9 times that under the basic parameters. This study not only showcases the extensive potential of the pyro-phototronic effect in enhancing heterojunction photodetectors for high-performance photodetection but also provides some ideas for fabricating high-performance photodetectors.
将氧化锌(ZnO)与氧化铜(CuO)等窄带隙材料相结合,是目前合成高性能光电器件的常用方法。本研究聚焦于通过利用热光电子效应,优化采用磁控溅射制备的p-CuO/n-ZnO异质结热释电光电探测器的性能。对该器件对紫外(365 nm)和可见光(405 nm)激光的光响应进行了全面研究。结果表明,通过调整溅射功率、溅射时间和溅射氧氩比这三个参数来调节器件性能时,最佳溅射参数如下:溅射功率120 W、溅射时间15分钟、溅射氧氩比1:3。在最佳溅射参数下,探测器的热释电效应和传统光伏效应的最大响应度Rpyro+photo是基本参数下的4.7倍,传统光伏效应的最大响应度Rphoto也是基本参数下的5.9倍。本研究不仅展示了热光电子效应在增强异质结光电探测器用于高性能光探测方面的巨大潜力,还为制备高性能光电探测器提供了一些思路。