Verma Ajay Kumar, Rahman Md Ataur, Vashishtha Pargam, Guo Xiangyang, Sehrawat Manoj, Mitra Rahul, Giridhar Sindhu P, Waqar Moaz, Bhoriya Ankit, Murdoch Billy J, Xu Chenglong, Zavabeti Ali, Song Wei Qian, Li Yongxiang, Dhakate Sanjay R, Gahtori Bhasker, Ahmed Taimur, Abidi Irfan H, Walia Sumeet
School of Engineering, RMIT University, 124 La Trobe Street, Melbourne, Victoria 3001, Australia.
CSIR-National Physical Laboratory, Dr. K.S. Krishnan Marg, New Delhi 110012, India.
ACS Nano. 2025 Jan 28;19(3):3478-3489. doi: 10.1021/acsnano.4c13037. Epub 2025 Jan 14.
Modern-day applications demand onboard electricity generation that can be achieved using piezoelectric phenomena. Reducing the dimensionality of materials is a pathway to enhancing the piezoelectric properties. Transition-metal dichalcogenides have been shown to exhibit high piezoelectricity. Monolayer MoS possesses strong piezoelectricity that is otherwise negligible in its bulk form. The presence of sulfur vacancy defects in two-dimensional MoS can starkly reduce piezoelectric output due to enhanced charge screening. Oxygen passivation offers thermodynamically favorable and superior vacancy passivation. Here, we demonstrate an in situ oxygen passivation of sulfur vacancies achieved by performing chemical vapor deposition in atmospheric pressure conditions, resulting in a dramatically enhanced piezoelectric output. We achieved an out-of-plane effective piezoelectric coefficient 0.54 pm/V for the MoS monolayer with sulfur vacancies (S-MoS) and 0.94 pm/V where sulfur vacancies are passivated by oxygen (O-MoS). The piezoelectric device (PED) based on O-MoS exhibits 26% higher output voltage than S-MoS with the maximum peak-to-peak value of 0.95 V. Additionally, we show that the O-MoS-based PED can charge a 330 nF capacitor 30% faster than the S-MoS PED for up to 50 mV in 0.5 s by repetitive finger tapping. The evolution of piezoelectricity in MoS with sulfur vacancy defect manipulation promises an avenue for scalable defect engineering for next-generation applications in miniaturized self-powered electronics and sensors across computing, healthcare, and size-, weight-, and power-constrained environments.
现代应用需要利用压电现象实现机载发电。降低材料的维度是增强压电性能的一条途径。过渡金属二硫属化物已被证明具有高压电性。单层MoS具有很强的压电性,而其体相形式的压电性则可以忽略不计。二维MoS中硫空位缺陷的存在会由于电荷屏蔽增强而显著降低压电输出。氧钝化提供了热力学上有利且优异的空位钝化效果。在此,我们展示了通过在大气压条件下进行化学气相沉积实现硫空位的原位氧钝化,从而显著提高了压电输出。对于具有硫空位的MoS单层(S-MoS),我们实现了面外有效压电系数为0.5 pm/V,而在硫空位被氧钝化的情况下(O-MoS)为0.94 pm/V。基于O-MoS的压电器件(PED)的输出电压比S-MoS高26%,最大峰峰值为0.95 V。此外,我们表明,通过重复手指轻敲,基于O-MoS的PED在0.5 s内为330 nF电容器充电的速度比基于S-MoS的PED快30%,充电电压可达50 mV。通过对具有硫空位缺陷的MoS的压电性进行调控,有望为下一代在计算、医疗保健以及尺寸、重量和功率受限环境中的小型化自供电电子设备和传感器应用提供可扩展的缺陷工程途径。