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通过电子背散射衍射和共焦拉曼光谱进行二维应变映射。

Two-dimensional strain-mapping by electron backscatter diffraction and confocal Raman spectroscopy.

作者信息

Gayle Andrew J, Friedman Lawrence H, Beams Ryan, Bush Brian G, Gerbig Yvonne B, Michaels Chris A, Vaudin Mark D, Cook Robert F

机构信息

Materials Measurement Science Division, National Institute of Standards and Technology, Gaithersburg, Maryland 20899, USA.

出版信息

J Appl Phys. 2017;122(20). doi: 10.1063/1.5001270.

Abstract

The strain field surrounding a spherical indentation in silicon is mapped in two dimensions (2-D) using electron backscatter diffraction (EBSD) cross-correlation and confocal Raman spectroscopy techniques. The 200 mN indentation created a diameter residual contact impression in the silicon (001) surface. Maps about area with 128 pixels × 128 pixels were generated in several hours, extending, by comparison, assessment of the accuracy of both techniques to mapping multiaxial strain states in 2-D. EBSD measurements showed a residual strain field dominated by in-surface normal and shear strains, with alternating tensile and compressive lobes extending about three to four indentation diameters from the contact and exhibiting two-fold symmetry. Raman measurements showed a residual Raman shift field, dominated by positive shifts, also extending about three to four indentation diameters from the contact but exhibiting four-fold symmetry. The 2-D EBSD results, in combination with a mechanical-spectroscopic analysis, were used to successfully predict the 2-D Raman shift map in scale, symmetry, and shift magnitude. Both techniques should be useful in enhancing the reliability of microelectromechanical systems (MEMS) through identification of the 2-D strain fields in MEMS devices.

摘要

利用电子背散射衍射(EBSD)互相关和共焦拉曼光谱技术在二维(2-D)上绘制了硅中球形压痕周围的应变场。200 mN的压痕在硅(001)表面产生了一个直径为 的残余接触压痕。在几个小时内生成了约128像素×128像素区域的图谱,相比之下,将两种技术的精度评估扩展到二维多轴应变状态的映射。EBSD测量显示残余应变场以表面法向应变和剪切应变为主,拉伸和压缩叶交替出现,从接触点延伸约三到四个压痕直径,并呈现出二重对称性。拉曼测量显示残余拉曼频移场以正向频移为主,同样从接触点延伸约三到四个压痕直径,但呈现出四重对称性。二维EBSD结果与机械光谱分析相结合,成功地在尺度、对称性和频移幅度上预测了二维拉曼频移图谱。这两种技术在通过识别微机电系统(MEMS)器件中的二维应变场来提高微机电系统的可靠性方面都应是有用的。

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本文引用的文献

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Piezo-Raman measurements and anharmonic parameters in silicon and diamond.硅和金刚石中的压电拉曼测量与非谐参数
Phys Rev B Condens Matter. 1990 Apr 15;41(11):7529-7535. doi: 10.1103/physrevb.41.7529.

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