使用 EBSD 互相关技术和原子力显微镜进行高分辨率表面形貌测量。
High resolution surface morphology measurements using EBSD cross-correlation techniques and AFM.
机构信息
Ceramics Division, National Institute of Standards and Technology, Gaithersburg, MD 20899, USA.
出版信息
Ultramicroscopy. 2011 Jul;111(8):1206-13. doi: 10.1016/j.ultramic.2011.01.039. Epub 2011 Feb 3.
The surface morphology surrounding wedge indentations in (001) Si has been measured using electron backscattered diffraction (EBSD) and atomic force microscopy (AFM). EBSD measurement of the lattice displacement field relative to a strain-free reference location allowed the surface uplift to be measured by summation of lattice rotations about the indentation axis. AFM was used in intermittent contact mode to determine surface morphology. The height profiles across the indentations for the two techniques agreed within 1 nm. Elastic uplift theory is used to model the data.
使用电子背散射衍射（EBSD）和原子力显微镜（AFM）测量了（001）Si 中楔形压痕周围的表面形貌。相对于无应变参考位置的晶格位移场的 EBSD 测量允许通过围绕压痕轴的晶格旋转求和来测量表面隆起。使用间歇接触模式的 AFM 确定表面形貌。两种技术在压痕处的高度轮廓相差 1nm 以内。弹性隆起理论用于对数据进行建模。
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