Ahmadisharaf Amin, Liu Bin, Edgar James H, Comer Jeffrey
Tim Taylor Department of Chemical Engineering, Kansas State University, Manhattan, Kansas 66506, United States.
Department of Anatomy and Physiology, Kansas State University, Manhattan, Kansas 66506, United States.
ACS Appl Mater Interfaces. 2025 Feb 19;17(7):11213-11226. doi: 10.1021/acsami.4c16991. Epub 2025 Jan 22.
Metal flux methods are excellent for synthesizing high-quality hexagonal boron nitride (hBN) crystals, but the atomic mechanisms of hBN nucleation and growth in these systems are poorly understood and difficult to probe experimentally. Here, we harness classical reactive molecular dynamics (ReaxFF) to unravel the mechanisms of hBN synthesis from liquid nickel solvent over time scales up to 30 ns. These simulations mimic experimental conditions by including relatively large liquid nickel slabs containing dissolved boron and a molecular nitrogen gas phase. Overall, the reaction takes place almost exclusively on the surface of the liquid nickel, owing to the low solubility of nitrogen in bulk nickel and the intermediate species' preference for the metal-gas interface. The formation of hBN invariably begins by reaction of dinitrogen with nickel-solvated boron atoms at the surface, forming intermediate N-N-B species, which typically evolve into B-N-B units through a short-lived intermediate where a single nitrogen atom is coordinated by one nitrogen and two boron atoms. The resulting B-N-B units, in turn, coalesce with growing hBN nuclei and carry nitrogen between hBN nanocrystals in an Ostwald ripening process. The amount of hBN produced on the tens of nanosecond time scale depends critically on the boron concentration, while having a much weaker dependence on the N pressure for the regime considered (N pressures of 2.5-10 MPa, Ni-B solutions with 6-12% boron by atom fraction). The highest rate of hBN formation occurs at the lowest temperature considered (1750 K, just above the melting point of nickel), while no hBN sheets are formed at 2000 K or above. An analysis of the transition pathways for nitrogen atoms shows that the final step, incorporation of small B-N motifs into larger hBN sheets, is the rate-limiting step in the regimes considered. While raising the temperature from 1750 to 2000 K has little effect on the formation of intermediates (N-N-B, B-N-B, etc.), the lack of large hBN sheets at temperatures >1900 K is explained by decreased probability of the final step and increased probability of breakup of hBN into B-N motifs.
金属助熔剂法非常适合用于合成高质量的六方氮化硼(hBN)晶体,但在这些体系中hBN成核和生长的原子机制却鲜为人知,且难以通过实验进行探究。在此,我们利用经典反应分子动力学(ReaxFF)来揭示在长达30纳秒的时间尺度上,从液态镍溶剂中合成hBN的机制。这些模拟通过纳入含有溶解硼的相对较大的液态镍板和分子氮气相来模拟实验条件。总体而言,由于氮在块状镍中的低溶解度以及中间物种对金属 - 气体界面的偏好,反应几乎完全在液态镍的表面发生。hBN的形成总是始于表面的二氮与镍溶剂化硼原子的反应,形成中间的N - N - B物种,这些物种通常通过一个短寿命的中间体演变成B - N - B单元,在这个中间体中,单个氮原子由一个氮原子和两个硼原子配位。生成的B - N - B单元进而与生长中的hBN核聚结,并在奥斯特瓦尔德熟化过程中在hBN纳米晶体之间传递氮。在数十纳秒的时间尺度上产生的hBN量关键取决于硼浓度,而在所考虑的压力范围(2.5 - 10 MPa的氮压力,原子分数为6 - 12%硼的Ni - B溶液)内对氮压力的依赖性要弱得多。hBN形成的最高速率出现在所考虑的最低温度(1750 K,略高于镍的熔点)下,而在2000 K及以上温度则不会形成hBN片层。对氮原子跃迁途径的分析表明,在所考虑的体系中,最后一步,即小的B - N基序并入更大的hBN片层,是速率限制步骤。虽然将温度从1750 K提高到2000 K对中间体(N - N - B、B - N - B等)的形成影响不大,但在温度>1900 K时缺乏大的hBN片层可以通过最后一步的概率降低以及hBN分解为B - N基序的概率增加来解释。