Iannaco Maria Chiara, Mancuso Antonietta, Mottola Stefania, Pipolo Andrea, Vaiano Vincenzo, De Marco Iolanda
Department of Industrial Engineering, University of Salerno, Via Giovanni Paolo II 132, 84084 Fisciano, Salerno, Italy.
Nanomaterials (Basel). 2025 Jan 10;15(2):102. doi: 10.3390/nano15020102.
Recently, the extensive use of antibiotics has unavoidably resulted in the discharge of significant quantities of these drugs into the environment, causing contamination and fostering antibiotic resistance. Among various approaches employed to tackle this problem, heterogeneous photocatalysis has emerged as a technique for antibiotic degradation. This study explores the potential of CeO as a photocatalyst for the degradation of chloramphenicol. Supercritical antisolvent (SAS) processing was successfully employed to synthesize photocatalyst precursor nanoparticles. After thermal annealing, the CeO samples were characterized through UV-Vis diffuse reflectance spectroscopy to evaluate the band gap energy values. Raman and FT-IR spectroscopy confirmed the presence of oxygen vacancies in the CeO lattice. During photocatalytic experiments, the CeO derived from the SAS-processed precursor exhibited superior photocatalytic performance compared to the catalyst synthesized from the non-micronized precursor. Various annealing temperatures were employed to tune the oxygen vacancy of CeO. Furthermore, the impact of catalyst dosage and chloramphenicol concentration was investigated. Under optimal reaction conditions (25 mg L chloramphenicol and 2.25 g L catalyst dosage), a degradation efficiency of 64% was achieved. Finally, to elucidate the degradation mechanism, different scavengers (EDTA, benzoquinone, and isopropyl alcohol) were utilized, revealing that the superoxide radical is the primary species responsible for chloramphenicol degradation.
最近，抗生素的广泛使用不可避免地导致大量此类药物排放到环境中，造成污染并助长抗生素耐药性。在用于解决这一问题的各种方法中，多相光催化已成为一种抗生素降解技术。本研究探讨了CeO作为光催化剂降解氯霉素的潜力。成功采用超临界抗溶剂（SAS）工艺合成了光催化剂前驱体纳米颗粒。经过热退火后，通过紫外可见漫反射光谱对CeO样品进行表征，以评估带隙能量值。拉曼光谱和傅里叶变换红外光谱证实了CeO晶格中存在氧空位。在光催化实验中，由SAS处理的前驱体制备的CeO表现出比由未微粉化的前驱体制备的催化剂更优异的光催化性能。采用不同的退火温度来调节CeO的氧空位。此外，还研究了催化剂用量和氯霉素浓度的影响。在最佳反应条件下（氯霉素浓度为25 mg/L，催化剂用量为2.25 g/L），降解效率达到64%。最后，为了阐明降解机理，使用了不同的清除剂（乙二胺四乙酸、苯醌和异丙醇），结果表明超氧自由基是导致氯霉素降解的主要物种。
