Arora Mankomal, Kaur Harpreet
Department of Chemistry, School of Chemical Engineering and Physical Sciences, Lovely professional University, Phagwara, Punjab, India.
Department of Chemistry, School of Chemical Engineering and Physical Sciences, Lovely professional University, Phagwara, Punjab, India.
Chemosphere. 2025 Mar;373:144122. doi: 10.1016/j.chemosphere.2025.144122. Epub 2025 Jan 27.
Gallic acid (GA) has emerged as a low biodegradable and high acidity industrial effluent. Due to mutagenic and carcinogenic nature of GA, it becomes essential to remove it from wastewater. Different chemical, physical and biological methods are being used for this purpose. Photocatalytic degradation is found to be promising method. In the present study N-doped titanium oxide and chitosan composites are used for the photodegradation of gallic acid. An attempt has been made to combine C from chitosan with undoped and N-doped TiO so as to produce composites that can suppress the electron-hole recombination, and reduce band gap thus enhancing their catalytic and adsorptive properties. The morphology and surface properties of the synthesized material were determined using techniques such as FTIR, XRD, XPS, BET, PL and SEM-EDX. The formation of spherical TiO and N-doped TiO occurred in anatase phase, over chitosan. The TiO/chitosan (TC) and N- TiO/chitosan (NTC) composites exhibited outstanding photodegradation activity 81% and 92.2% for the GA under visible irradiation (λ > 400 nm) at acidic pH. The desired outcomes of the nitrogen and carbon doping in the metal oxide (NTC) include a highly homogenous surface, a lowered band gap, an increase in the material's surface area, improved reusability, and a decrease in photoluminescence, which suggests that the material's electron-hole recombination is delayed. The purpose of the current study is to gain an understanding of how doping (C/N) affects the development of a photocatalyst that may be used to remove GA from industrial effluent.
没食子酸（GA）已成为一种难生物降解且酸性高的工业废水。由于GA具有致突变和致癌性，从废水中去除它变得至关重要。为此正在使用不同的化学、物理和生物方法。光催化降解被认为是一种有前景的方法。在本研究中，N掺杂的二氧化钛和壳聚糖复合材料被用于没食子酸的光降解。已尝试将壳聚糖中的C与未掺杂和N掺杂的TiO结合，以制备能够抑制电子 - 空穴复合、减小带隙从而增强其催化和吸附性能的复合材料。使用FTIR、XRD、XPS、BET、PL和SEM - EDX等技术确定了合成材料的形态和表面性质。球形TiO和N掺杂的TiO在壳聚糖上以锐钛矿相形成。TiO/壳聚糖（TC）和N - TiO/壳聚糖（NTC）复合材料在酸性pH值下可见光照射（λ > 400 nm）时对GA表现出出色的光降解活性，分别为81%和92.2%。金属氧化物（NTC）中氮和碳掺杂的预期结果包括高度均匀的表面、降低的带隙、材料表面积的增加、提高的可重复使用性以及光致发光的降低，这表明材料的电子 - 空穴复合被延迟。本研究的目的是了解掺杂（C/N）如何影响可用于从工业废水中去除GA的光催化剂的开发。
