Vu Tuan V, Hieu Nguyen N, Hiep Nguyen T, Trinh Thuat T, Kartamyshev A I, Phuc Huynh V
Laboratory for Computational Physics, Institute for Computational Science and Artificial Intelligence, Van Lang University, Ho Chi Minh City, Vietnam.
Faculty of Mechanical - Electrical and Computer Engineering, School of Technology, Van Lang University, Ho Chi Minh City, Vietnam.
Phys Chem Chem Phys. 2025 Mar 6;27(10):5131-5140. doi: 10.1039/d4cp04674a.
In the present work, we attempt to construct two-dimensional AlSiX (X = N, P, As) monolayers and examine their stabilities, Raman activity, piezoelectricity, as well as electronic/transport properties for various applications, using first-principles calculations. All three - AlSiN, AlSiP and AlSiAs - configurations are confirmed to have good dynamic, thermal, and mechanical stabilities from their phonon spectra, molecular dynamics investigations, and attained elastic constants/cohesive energy results. The Raman spectra of the AlSiX monolayers are performed using the finite displacement technique to assess their vibrational properties and Raman activities. The calculated electronic band structures of the studied monolayers reveal their semiconductor behaviors. The AlSiN monolayer shows a direct band-gap meanwhile the AlSiP and AlSiAs monolayers exhibit an indirect band-gap. The AlSiX monolayers are found as piezoelectric materials with the in-plane piezoelectric effects. The AlSiN has the in-plane piezoelectric coefficient value of 0.43 pm V, whereas the AlSiP and AlSiAs monolayers have the higher absolute values of -0.76 and -0.71 pm V, respectively. Moreover, we also examine the carrier mobilities of the AlSiX monolayers for their transport properties by utilizing the deformation potential approach. The AlSiN, AlSiP, and AlSiAs monolayers exhibit high and anisotropic electron mobilities. The achieved mobility of electrons are 1096.01 and 1765.43 cm V s in the direction for the AlSiN and AlSiP monolayers, respectively. AlSiAs shows the highest electron mobility of 2027.28 cm V s in the direction and 1120.49 cm V s in the direction. The findings in our study demonstrate that the AlSiX monolayers are potential piezoelectric semiconductors with impressive anisotropic electron mobilities and favorable band-gaps for applications in electronic, photovoltaic, optic, and piezoelectric fields.
在本工作中,我们尝试构建二维AlSiX(X = N、P、As)单层,并使用第一性原理计算来研究它们的稳定性、拉曼活性、压电性以及适用于各种应用的电子/输运性质。通过声子谱、分子动力学研究以及获得的弹性常数/结合能结果,证实AlSiN、AlSiP和AlSiAs这三种构型都具有良好的动力学、热学和力学稳定性。使用有限位移技术对AlSiX单层的拉曼光谱进行了测定,以评估其振动性质和拉曼活性。所研究单层的计算电子能带结构揭示了它们的半导体行为。AlSiN单层呈现直接带隙,而AlSiP和AlSiAs单层表现出间接带隙。发现AlSiX单层是具有面内压电效应的压电材料。AlSiN的面内压电系数值为0.43 pm V,而AlSiP和AlSiAs单层分别具有更高的绝对值-0.76和-0.71 pm V。此外,我们还利用形变势方法研究了AlSiX单层的载流子迁移率以了解其输运性质。AlSiN、AlSiP和AlSiAs单层表现出高且各向异性的电子迁移率。对于AlSiN和AlSiP单层,在 方向上实现的电子迁移率分别为1096.01和1765.43 cm V s。AlSiAs在 方向上显示出最高的电子迁移率2027.28 cm V s,在 方向上为1120.49 cm V s。我们研究中的发现表明,AlSiX单层是潜在的压电半导体,具有令人印象深刻的各向异性电子迁移率和适用于电子、光伏、光学和压电场应用的有利带隙。