Xu Xiaoyan, Zhao Yujie, Geng Kangshuai, Sun Yupei, Wei Yi, Hou Hongwei
College of Chemistry, Zhengzhou University, Zhengzhou, Henan 450001, P. R. China.
Faculty of Science, Henan University of Animal Husbandry and Economy, Zhengzhou, Henan 450046, P. R. China.
Inorg Chem. 2025 Mar 24;64(11):5724-5733. doi: 10.1021/acs.inorgchem.5c00413. Epub 2025 Mar 7.
MOF@CeO composites with good interfacial compatibility have garnered significant attention in the field of third-order nonlinear optics (NLO). However, the interfacial interaction between the MOFs and CeO is commonly weak, which severely weakens the third-order NLO properties of the composites. In this study, we chose the parent Zn-MOF ({[Zn(BPAN)(ndcpa)]·DMA·HO}) (BPAN = 9,10-bis(4-pyridyl)anthracene and Hndcpa = naphthalene-2,6-dicarboxylicacid) and synthesized bimetallic-MOFs (ZnNi-MOF and ZnCo-MOF) by solvent-assisted metal-ion exchange. The defect sites originating from the exchange make the interface interaction of bimetallic-MOF@CeO composites (ZnNi-MOF@CeO and ZnCo-MOF@CeO) stronger. The third-order NLO results indicate bimetallic-MOF@CeO composites display enhanced reverse saturable absorption and self-defocusing refraction properties compared to Zn-MOF@CeO, which can be attributed to efficient charge transfer at interfaces. Transient absorption spectra and theoretical calculation revealed that good interfacial compatibility significantly reduced interfacial energy loss, enhanced electron transfer efficiency, and positively modulated the third-order NLO properties. This study provides new insights and methodologies for the design and development of novel third-order NLO composites.
具有良好界面相容性的金属有机框架(MOF)@CeO复合材料在三阶非线性光学(NLO)领域引起了广泛关注。然而,MOF与CeO之间的界面相互作用通常较弱,这严重削弱了复合材料的三阶NLO性能。在本研究中,我们选择了母体Zn-MOF({[Zn(BPAN)(ndcpa)]·DMA·H₂O})(BPAN = 9,10-双(4-吡啶基)蒽,Hndcpa = 萘-2,6-二羧酸),并通过溶剂辅助金属离子交换合成了双金属MOF(ZnNi-MOF和ZnCo-MOF)。源自交换的缺陷位点使双金属MOF@CeO复合材料(ZnNi-MOF@CeO和ZnCo-MOF@CeO)的界面相互作用更强。三阶NLO结果表明,与Zn-MOF@CeO相比,双金属MOF@CeO复合材料表现出增强的反饱和吸收和自散焦折射特性,这可归因于界面处的有效电荷转移。瞬态吸收光谱和理论计算表明,良好的界面相容性显著降低了界面能量损失,提高了电子转移效率,并正向调节了三阶NLO性能。本研究为新型三阶NLO复合材料的设计和开发提供了新的见解和方法。