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通过电镀废水共掺杂铜在可见光照射下显著增强TiO-N活性用于降解水介质中阿莫西林残留

Remarkable Enhancement of TiO-N Activity under Visible Light Exposure by Codoping with Cu from Electroplating Wastewater for Degradation of Amoxicillin Residual in Water Media.

作者信息

Suwondo Kusuma Putri, Alharissa Early Zahwa, Aprilita Nurul Hidayat, Tri Wahyuni Endang

机构信息

Research Center for Advanced Materials, National Research and Innovation Agency (BRIN), South Tangerang, Banten 14314, Indonesia.

Chemistry Department, Faculty of Mathematics and Natural Sciences, Gadjah Mada University, Yogyakarta 55281, Indonesia.

出版信息

ACS Omega. 2025 Feb 19;10(8):7722-7733. doi: 10.1021/acsomega.4c07853. eCollection 2025 Mar 4.

DOI:10.1021/acsomega.4c07853
PMID:40060802
原文链接:https://pmc.ncbi.nlm.nih.gov/articles/PMC11886634/
Abstract

The development of photocatalysts with wastewater management has drawn the attention of many scientists. This research investigates the enhancement activity of TiO photocatalyst codoped with N and Cu from urea and electroplating wastewater respectively as sources, for photodegradation of amoxicillin (AMX) residual in water media. The synthesis of codoped TiO photocatalyst has been done through sol-gel process to determine the optimal concentration for each single dopant of Cu and N based on the highest band gap energy ( ) narrowing and their performance in photodegradation of AMX. The synthesized photocatalysts are investigated by material characterization. The effect of the double dopants on the photocatalyst activity was examined through photodegradation of AMX. The optimum N and Cu dopant concentrations were 30 and 0.60 wt %, giving values of 2.88 and 2.93 eV, respectively. This ratio is used to synthesize the codoping photocatalyst that significantly reduces in 2.74 eV with AMX photodegradation reaching 95.76%. This dwindling of band gap energy in codoping photocatalyst could be widely applied in visible light exposure for the photodegradation of AMX having 20 mg/L in 50 mL over TiO-N,Cu (30:0.6 wt %) using 1 g/L of the photocatalyst dose, solution pH 5, and 120 min irradiation time.

摘要

用于废水处理的光催化剂的开发引起了许多科学家的关注。本研究分别以尿素和电镀废水为氮和铜的来源,研究了共掺杂TiO光催化剂对水介质中阿莫西林(AMX)残留的光降解增强活性。共掺杂TiO光催化剂的合成通过溶胶-凝胶法完成,以基于最大带隙能量( )变窄及其在AMX光降解中的性能来确定铜和氮每种单一掺杂剂的最佳浓度。通过材料表征对合成的光催化剂进行研究。通过AMX的光降解研究了双掺杂剂对光催化剂活性的影响。最佳的氮和铜掺杂剂浓度分别为30 wt%和0.60 wt%,对应的 值分别为2.88 eV和2.93 eV。该比例用于合成共掺杂光催化剂,其显著降低至2.74 eV,AMX光降解率达到95.76%。这种共掺杂光催化剂带隙能量的减小可广泛应用于可见光照射下,使用1 g/L的光催化剂剂量、溶液pH值为5以及120分钟的照射时间,对50 mL中20 mg/L的AMX在TiO-N,Cu(30:0.6 wt%)上进行光降解。

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