Harfagar Gustavo, Solis Sebastian, Hernandez Marcela, Fehmer Vincent, Sailer Irena, Azevedo Luís
Private Practice at Matanzas Clinic, Navidad, Chile.
Private Practice at Zenit Dental, Santiago, Chile.
Clin Implant Dent Relat Res. 2025 Apr;27(2):e70022. doi: 10.1111/cid.70022.
To compare the linear and angular deviations of conventional implant (CI) and digital implant (DI) impression techniques in edentulous jaws with four or six implants.
Twenty participants (12 men, 8 women; mean age 58.6 years) with complete edentulous maxillary (n = 8) or mandibular (n = 12) arches were included. Each patient received four or six dental implants (Straumann BLX). Both CI and DI were performed using randomized sequences. Linear and angular deviations were measured between the reference scan (coordinated measuring machine) and the CI (desktop scanner) and DI (intraoral scanner, IOS) using CATIA software (Dassault Systèmes). Framework passivity was evaluated using the Sheffield one-screw test. The Shapiro-Wilk test determined data normality (p < 0.05), and nonparametric statistical tests were applied using statistical software.
Descriptive statistics showed a mean linear discrepancy of 29.05 (84.80 μm) for CI and 6.95 (154.10 μm) for DI, with angular deviations of 0.06° (0.36°) for CI and 0.05° (1.40°) for DI. No statistically significant differences were found in linear (p = 0.38) or angular (p = 0.12) measurements between CI and DI. Framework passivity testing showed that both techniques achieved passive fit in 17 out of 20 cases (85%), with the reference scan achieving passivity in 18 (90%) cases. Distal implants, particularly in the upper jaw, exhibited greater discrepancies, but none were statistically significant.
No significant differences in trueness were found between CI and DI techniques. Both methods demonstrated comparable trueness and framework passivity, supporting the use of IOS as a reliable alternative to CI in edentulous jaws with multiple implants.
比较传统种植体(CI)印模技术和数字化种植体(DI)印模技术在无牙颌植入4颗或6颗种植体时的线性和角度偏差。
纳入20名参与者(12名男性,8名女性;平均年龄58.6岁),其上颌(n = 8)或下颌(n = 12)牙弓完全无牙。每位患者植入4颗或6颗牙科种植体(士卓曼BLX)。CI和DI均采用随机顺序进行。使用CATIA软件(达索系统公司)测量参考扫描(坐标测量机)与CI(台式扫描仪)和DI(口内扫描仪,IOS)之间的线性和角度偏差。使用谢菲尔德单螺钉测试评估支架被动就位情况。夏皮罗-威尔克检验确定数据正态性(p < 0.05),并使用统计软件进行非参数统计检验。
描述性统计显示,CI的平均线性差异为29.05(84.80μm),DI为6.95(154.10μm),CI的角度偏差为0.06°(0.36°),DI为0.05°(1.40°)。CI和DI之间的线性(p = 0.38)或角度(p = 0.12)测量未发现统计学显著差异。支架被动就位测试表明,两种技术在20例中有17例(85%)实现了被动就位,参考扫描在18例(90%)中实现了被动就位。远端种植体,尤其是在上颌,表现出更大的差异,但均无统计学意义。
CI和DI技术在精确性方面未发现显著差异。两种方法均显示出相当的精确性和支架被动就位情况,支持在植入多颗种植体的无牙颌中使用IOS作为CI的可靠替代方法。