Metternich Daniel, Litzius Kai, Wintz Sebastian, Gerlinger Kathinka, Petz Sascha, Engel Dieter, Sidiropoulos Themistoklis, Battistelli Riccardo, Steinbach Felix, Weigand Markus, Wittrock Steffen, von Korff Schmising Clemens, Büttner Felix
Experimental Physics V, Center for Electronic Correlations and Magnetism, University of Augsburg, 86159 Augsburg, Germany.
Helmholtz-Zentrum Berlin, 14109 Berlin, Germany.
Struct Dyn. 2025 Apr 18;12(2):024504. doi: 10.1063/4.0000287. eCollection 2025 Mar.
Helicity-independent all-optical switching (HI-AOS) is the fastest known way to switch the magnetic order parameter. While the switching process of extended areas is well understood, the formation of domain walls enclosing switched areas remains less explored. Here, we study domain walls around all-optically nucleated magnetic domains using x-ray vector spin imaging and observe a high density of vertical Bloch line defects. Surprisingly, the defect density appears to be independent of optical pulse parameters, significantly varies between materials, and is only slightly higher than in domain walls generated by field cycling. A possible explanation is given by time-resolved Kerr microscopy, which reveals that magnetic domains considerably expand after the initial AOS process. During this expansion, and likewise during field cycling, domain walls propagate at speeds above the Walker breakdown. Micromagnetic simulations suggest that at such speeds, domain walls accumulate defects when moving over magnetic pinning sites, explaining similar defect densities after two very different switching processes. The slightly larger defect density after AOS compared to field-induced switching indicates that some defects are created already when the domain wall comes into existence. Our work shows that engineered low-pinning materials are a key ingredient to uncover the intrinsic dynamics of domain wall formation during ultrafast all-optical switching.
与螺旋度无关的全光开关(HI-AOS)是已知切换磁序参量最快的方法。虽然扩展区域的切换过程已得到充分理解,但围绕已切换区域的畴壁形成仍较少被探索。在这里,我们使用X射线矢量自旋成像研究全光成核磁畴周围的畴壁,并观察到高密度的垂直布洛赫线缺陷。令人惊讶的是,缺陷密度似乎与光脉冲参数无关,在不同材料之间有显著差异,且仅略高于通过场循环产生的畴壁中的缺陷密度。时间分辨克尔显微镜给出了一个可能的解释,它揭示了在初始的全光开关过程之后磁畴会大幅扩展。在这个扩展过程中,同样在场循环过程中,畴壁以高于沃克击穿的速度传播。微磁模拟表明,在这样的速度下,畴壁在磁钉扎位点上移动时会积累缺陷,这解释了在两种非常不同的切换过程之后缺陷密度相似的原因。与场致开关相比,全光开关后稍大的缺陷密度表明,在畴壁形成时就已经产生了一些缺陷。我们的工作表明,设计的低钉扎材料是揭示超快全光开关过程中畴壁形成内在动力学的关键因素。