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基于微调VGG-16的迁移学习对极紫外多层膜缺陷轮廓参数进行重建

Extreme Ultraviolet Multilayer Defect Profile Parameters Reconstruction via Transfer Learning with Fine-Tuned VGG-16.

作者信息

Mohammad Hala, Li Jiawei, Li Bochao, Baraya Jamilu Tijjani, Kone Sana, Zhao Zhenlong, Song Xiaowei, Lin Jingquan

机构信息

School of Physics, Changchun University of Science and Technology, Changchun 130022, China.

Zhongshan Research Institute, Changchun University of Science and Technology, Zhongshan 528400, China.

出版信息

Micromachines (Basel). 2025 Apr 30;16(5):541. doi: 10.3390/mi16050541.

DOI:10.3390/mi16050541
PMID:40428676
原文链接:https://pmc.ncbi.nlm.nih.gov/articles/PMC12113655/
Abstract

Extracting defect profile parameters from measured defect images poses a significant challenge in extreme ultraviolet (EUV) multilayer defect metrologies, because these parameters are crucial for assessing defect printing behavior and determining appropriate repair strategies. This paper proposes to reconstruct defect profile parameters from reflected field intensity images of a phase defect assisted by transfer learning with fine-tuning. These images are generated through simulations using the rigorous finite-difference time-domain (FDTD) method. The VGG-16 pre-trained model, known for its robust feature extraction capability, is adopted and fine-tuned to map the intensity images to the defect profile parameters. The results demonstrate that the proposed approach accurately reconstructs multilayer defect profile parameters, thus providing important information for mask repair strategies.

摘要

从测量的缺陷图像中提取缺陷轮廓参数在极紫外(EUV)多层缺陷计量学中是一项重大挑战,因为这些参数对于评估缺陷印刷行为和确定合适的修复策略至关重要。本文提出在微调的迁移学习辅助下,从相位缺陷的反射场强图像中重建缺陷轮廓参数。这些图像是通过使用严格的时域有限差分(FDTD)方法进行模拟生成的。采用以强大特征提取能力著称的VGG - 16预训练模型并进行微调,以将强度图像映射到缺陷轮廓参数。结果表明,所提出的方法能够准确重建多层缺陷轮廓参数,从而为掩膜修复策略提供重要信息。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/ebca/12113655/1c20fbe2837d/micromachines-16-00541-g010.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/ebca/12113655/75312d36cd5b/micromachines-16-00541-g001.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/ebca/12113655/82b39e6975c2/micromachines-16-00541-g002.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/ebca/12113655/c0ad166032c8/micromachines-16-00541-g003.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/ebca/12113655/66eb469a29f1/micromachines-16-00541-g004.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/ebca/12113655/838be107db5f/micromachines-16-00541-g005.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/ebca/12113655/60215539ba72/micromachines-16-00541-g006.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/ebca/12113655/4d2c52542f6e/micromachines-16-00541-g007.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/ebca/12113655/df1231315f8c/micromachines-16-00541-g008.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/ebca/12113655/90e021c82e69/micromachines-16-00541-g009.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/ebca/12113655/1c20fbe2837d/micromachines-16-00541-g010.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/ebca/12113655/75312d36cd5b/micromachines-16-00541-g001.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/ebca/12113655/82b39e6975c2/micromachines-16-00541-g002.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/ebca/12113655/c0ad166032c8/micromachines-16-00541-g003.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/ebca/12113655/66eb469a29f1/micromachines-16-00541-g004.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/ebca/12113655/838be107db5f/micromachines-16-00541-g005.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/ebca/12113655/60215539ba72/micromachines-16-00541-g006.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/ebca/12113655/4d2c52542f6e/micromachines-16-00541-g007.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/ebca/12113655/df1231315f8c/micromachines-16-00541-g008.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/ebca/12113655/90e021c82e69/micromachines-16-00541-g009.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/ebca/12113655/1c20fbe2837d/micromachines-16-00541-g010.jpg

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Phase defect characterization using generative adversarial networks for extreme ultraviolet lithography.利用生成对抗网络对极紫外光刻的相缺陷进行特征描述。
Appl Opt. 2023 Feb 10;62(5):1243-1252. doi: 10.1364/AO.480356.
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Anomalous light scattering from multilayer coatings with nodular defects.
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A novel method for peanut variety identification and classification by Improved VGG16.一种利用改进 VGG16 进行花生品种识别和分类的新方法。
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Extreme ultraviolet phase defect characterization based on complex amplitudes of the aerial images.基于空间图像复振幅的极紫外相位缺陷表征
Appl Opt. 2021 Jun 10;60(17):5208-5219. doi: 10.1364/AO.425941.
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Automated detection of COVID-19 using ensemble of transfer learning with deep convolutional neural network based on CT scans.基于 CT 扫描的深度学习卷积神经网络集成迁移学习的 COVID-19 自动检测。
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EUV multilayer defect characterization via cycle-consistent learning.通过循环一致学习进行极紫外多层膜缺陷表征
Opt Express. 2020 Jun 8;28(12):18493-18506. doi: 10.1364/OE.394590.
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Fast extreme ultraviolet lithography mask near-field calculation method based on machine learning.基于机器学习的快速极紫外光刻掩膜近场计算方法
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