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通过液相外延生长的用于闪烁探测器的掺铽钆镓石榴石薄膜。

Terbium-doped gadolinium garnet thin films grown by liquid phase epitaxy for scintillation detectors.

作者信息

Baillard Amandine, Douissard Paul-Antoine, Loiko Pavel, Martin Thierry, Mathieu Eric, Camy Patrice

机构信息

Centre de Recherche sur les Ions, les Matériaux et la Photonique (CIMAP), UMR 6252 CEA-CNRS-ENSICAEN, Université de Caen Normandie 6 Boulevard Maréchal Juin 14050 Caen Cedex 4 France

European Synchrotron Radiation Facility (ESRF) 71 Avenue des Martyrs 38043 Grenoble France.

出版信息

RSC Adv. 2025 Jun 4;15(24):18802-18813. doi: 10.1039/d5ra01784j.

DOI:10.1039/d5ra01784j
PMID:40476245
原文链接:https://pmc.ncbi.nlm.nih.gov/articles/PMC12135170/
Abstract

Single-crystal films of terbium-doped gadolinium gallium garnet (GdGaO:Tb) were grown by the isothermal dipping liquid phase epitaxy method on undoped (111)-oriented GGG substrates using PbO/BO as a solvent. The effect of the Tb doping level (2 to 10 at%) on the growth parameters, structure, composition, morphology, and emission properties of the films under optical and X-ray excitation was systematically studied. The saturation temperature increased almost linearly with the Tb content. The Tb-doped films exhibit a very low lattice mismatch of less than 0.05% with respect to the GGG substrate. The dopant ions are uniformly incorporated in the layers, with a segregation coefficient close to unity. The conversion efficiency of the films is optimized for a doping level of 6 at% Tb in the solution, reaching a maximum light output of 52% with respect to a reference bulk YAG:Ce crystal. The green emission of Tb ions at 543 nm matches with the maximum of sensitivity of CCD/CMOS sensors. The luminescence lifetime of the D Tb emitting state amounts to ∼2.3 ms and is weakly dependent on the doping level. Minimum afterglow intensities are reached for the GGG:Tb films, as compared to other currently employed scintillators. GdGaO:Tb single-crystalline films represent a viable solution for developing novel scintillators providing high efficiency and sub-μm spatial resolution for X-ray imaging.

摘要

采用等温浸液相外延法,以PbO/BO为溶剂,在未掺杂的(111)取向GGG衬底上生长了掺铽钆镓石榴石(GdGaO:Tb)单晶薄膜。系统研究了铽掺杂水平(2%至10%原子分数)对薄膜在光学和X射线激发下的生长参数、结构、成分、形貌和发射特性的影响。饱和温度几乎随铽含量线性增加。掺铽薄膜与GGG衬底的晶格失配非常低,小于0.05%。掺杂离子均匀地掺入各层中,分凝系数接近1。对于溶液中铽掺杂水平为6%原子分数的情况,薄膜的转换效率得到优化,相对于参考块状YAG:Ce晶体,最大光输出达到52%。铽离子在543nm处的绿色发射与CCD/CMOS传感器的最大灵敏度相匹配。D铽发射态的发光寿命约为2.3ms,且对掺杂水平的依赖性较弱。与其他目前使用的闪烁体相比,GGG:Tb薄膜的余辉强度最低。GdGaO:Tb单晶薄膜是开发新型闪烁体的可行解决方案,可为X射线成像提供高效率和亚微米空间分辨率。

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