Yang Rui, Xu Jingjun, Zhang Guoquan
The MOE Key Laboratory of Weak-Light Nonlinear Photonics, School of Physics and TEDA Applied Physics Institute, Nankai University, Tianjin 300071, People's Republic of China.
J Phys Condens Matter. 2025 Jul 8;37(28). doi: 10.1088/1361-648X/ade8ca.
The development of lithium niobate (LiNbO, LN)-based active devices has been limited by the absence of stable-type conductivity. Overcoming this challenge is critical for unlocking the full potential of LN in optoelectronic applications. Through first-principles calculations, we have identified nitrogen (N) as the most effective-type dopant among elements near oxygen (O) in the periodic table. However, mono-acceptor N doping creates defect levels 0.415 eV above the valence band maximum (VBM). We propose to passivate the N dopant by introducing a small amount of impurity magnesium (Mg). This doping process involves two steps: first, N-Mg co-doping with equal amounts creates fully occupied impurity bands; second, excess N doping the fully occupied impurity bands introduces shallow defect levels. Quantitative results show that in 2N+Mg co-doped LN the defect level is only 0.115 eV (about 0.3 eV lower than that of mono-acceptor N-doping) above the VBM. Correspondingly, the(0/-1) transition level is found at 0.067 eV (about 0.243 eV lower than that of mono-acceptor N-doping), indicating a typical shallow acceptor. Co-doping also lowers the defect formation energy by ∼1.9 eV, boosting dopant solubility. These key data demonstrate that the donor and excess acceptor co-doping strategy effectively converts the defect levels into shallow levels, reduces defect formation energy, and enhances local doping stability in-type LN, thereby laying the foundation for the development of LN-basedjunction and active optoelectronic devices.
铌酸锂(LiNbO₃,LN)基有源器件的发展一直受到缺乏稳定型导电性的限制。克服这一挑战对于释放LN在光电子应用中的全部潜力至关重要。通过第一性原理计算,我们确定氮(N)是元素周期表中氧(O)附近元素中最有效的掺杂剂。然而,单受主N掺杂会在价带最大值(VBM)上方0.415 eV处产生缺陷能级。我们建议通过引入少量杂质镁(Mg)来钝化N掺杂剂。这种掺杂过程包括两个步骤:首先,等量的N-Mg共掺杂形成完全占据的杂质带;其次,过量的N掺杂到完全占据的杂质带中会引入浅缺陷能级。定量结果表明,在2N+Mg共掺杂的LN中,缺陷能级仅在VBM上方0.115 eV(比单受主N掺杂低约0.3 eV)。相应地,(0/-1)跃迁能级在0.067 eV处被发现(比单受主N掺杂低约0.243 eV),表明是典型的浅受主。共掺杂还使缺陷形成能降低了约1.9 eV,提高了掺杂剂的溶解度。这些关键数据表明,施主和过量受主共掺杂策略有效地将缺陷能级转化为浅能级,降低了缺陷形成能,并增强了n型LN中的局部掺杂稳定性,从而为基于LN的结型和有源光电器件的发展奠定了基础。