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通过双氯诱导策略构建和稳定铜/铜位点用于将二氧化碳电还原为甲烷

Constructing and stabilizing Cu/Cu sites through dual chlorine-induced strategy for CO electroreduction to CH.

作者信息

Chen Bairong, Li Wenjiong, Xia Runlin, Wang Xiaoyu, Hu Hanchi, Dai Hangxiang, Guan Qingxin, Wang Cai, Liu Yuping, Li Wei

机构信息

State Key Laboratory of Elemento-Organic Chemistry, Key Laboratory of Adv. Energy Mater. Chemistry (Ministry of Education), College of Chemistry, Nankai University, Tianjin 300071, China.

State Key Laboratory of Elemento-Organic Chemistry, Key Laboratory of Adv. Energy Mater. Chemistry (Ministry of Education), College of Chemistry, Nankai University, Tianjin 300071, China.

出版信息

J Colloid Interface Sci. 2025 Dec;699(Pt 2):138237. doi: 10.1016/j.jcis.2025.138237. Epub 2025 Jun 18.

Abstract

Cu-based catalysts with Cu/Cu dual sites demonstrate unique synergistic advantages in promoting CO electroreduction. To construct effective Cu/Cu sites, inhibiting over-reduction of Cu species is essential while remains a critical challenge due to their inherent thermodynamic instability. Herein, we propose a dual chlorine regulation strategy involving chlorine doping within the CuO matrix and chlorine supplementation in the electrolyte to enhance the stability and activity of Cu/Cu sites during CO-to-CH conversion. Notably, the chlorine-doped CuO (Cl-CuO) electrode in 0.1 M KHCO + 0.2 M KCl exhibited a ∼2.5-fold improvement in ethylene Faradaic efficiency (FE increased from 13.0 % to 32.0 %) along with a 4-fold enhancement in operational lifetime compared to pristine CuO evaluated in 0.3 M KHCO. The combined results of control experiments, theoretical calculations and in situ characterizations demonstrate that the strong electronic interaction between Cu and Cl effectively suppressed oxygen vacancy formation and retarded the reduction kinetics of Cu species in reconstructed Cu/Cu active sites, which further lowered the energy barrier for adsorption of *CO intermediates and facilitated the C-C coupling. Furthermore, introducing Cl into the electrolyte significantly mitigated chlorine leaching from the catalyst surface, making Cu/Cu active sites stably operate for CH production. This study provided a novel insight into the stability enhancement mechanism of Cu/Cu sites and offered a reference for design of Cu-based catalysts for more electrocatalytic reactions.

摘要

具有Cu/Cu双位点的铜基催化剂在促进CO电还原方面展现出独特的协同优势。为构建有效的Cu/Cu位点,抑制铜物种的过度还原至关重要,但由于其固有的热力学不稳定性,这仍然是一个严峻的挑战。在此,我们提出一种双氯调控策略,包括在CuO基体中进行氯掺杂以及在电解液中补充氯,以增强CO转化为CH过程中Cu/Cu位点的稳定性和活性。值得注意的是,与在0.3 M KHCO中评估的原始CuO相比,在0.1 M KHCO + 0.2 M KCl中的氯掺杂CuO(Cl-CuO)电极的乙烯法拉第效率提高了约2.5倍(FE从13.0%提高到32.0%),同时运行寿命提高了4倍。对照实验、理论计算和原位表征的综合结果表明,Cu和Cl之间的强电子相互作用有效抑制了氧空位的形成,并延缓了重构的Cu/Cu活性位点中铜物种的还原动力学,这进一步降低了*CO中间体吸附的能垒并促进了C-C偶联。此外,将Cl引入电解液显著减轻了催化剂表面的氯浸出,使Cu/Cu活性位点能够稳定地用于CH生产。本研究为Cu/Cu位点稳定性增强机制提供了新的见解,并为设计用于更多电催化反应的铜基催化剂提供了参考。

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