Zhang Junyi, Zhao Deyu, Li Yue, Ming Gege, Pei Weihua
The School of Advanced Technology, Xi'an Jiaotong-Liverpool University, Suzhou 215000, China.
The EEG Techonology Co., Ltd., Suzhou 215100, China.
Sensors (Basel). 2025 Jun 28;25(13):4037. doi: 10.3390/s25134037.
Currently, the electroencephalogram (EEG) cap is limited to a finite number of sizes based on head circumference, lacking the mechanical flexibility to accommodate the full range of skull dimensions. This reliance on head circumference data alone often results in a poor fit between the EEG cap and the user's head shape. To address these limitations, we have developed a four-dimensional (4D) adjustable EEG cap. This cap features an adjustable mechanism that covers the entire cranial area in four dimensions, allowing it to fit the head shapes of nearly all adults. The system is compatible with 64 channels or lower electrode counts. We conducted a study with numerous volunteers to compare the performance characteristics of the 4D caps with the commercial (COML) caps in terms of contact pressure, preparation time, wearing impedance, and performance in brain-computer interface (BCI) applications. The 4D cap demonstrated the ability to adapt to various head shapes more quickly, reduce impedance during testing, and enhance measurement accuracy, signal-to-noise ratio (SNR), and comfort. These improvements suggest its potential for broader application in both laboratory settings and daily life.
目前，脑电图（EEG）帽基于头围仅有有限的几种尺寸，缺乏适应各种颅骨尺寸的机械灵活性。仅依赖头围数据往往导致EEG帽与使用者头部形状的贴合度不佳。为解决这些局限性，我们开发了一种四维（4D）可调节EEG帽。这种帽子具有一种可调节机制，能在四个维度上覆盖整个颅部区域，使其能够适配几乎所有成年人的头部形状。该系统与64通道或更低电极数量兼容。我们对众多志愿者进行了一项研究，以比较4D帽与商用（COML）帽在接触压力、准备时间、佩戴阻抗以及脑机接口（BCI）应用中的性能特征。4D帽展现出能更快适应各种头部形状、在测试期间降低阻抗并提高测量精度、信噪比（SNR）以及舒适度的能力。这些改进表明其在实验室环境和日常生活中更广泛应用的潜力。
